Title: 193-nm Immersion Lithography with Double-Patterning-Advance to the 22nm
Abstract:The optical lithography technology with double patterning,high refractive index lens materials and immersion media,32 nm and 22 nm immersion lithography status of progress in lithography is outlined i...The optical lithography technology with double patterning,high refractive index lens materials and immersion media,32 nm and 22 nm immersion lithography status of progress in lithography is outlined in this paper,and pointing out that the optical lithography technology trends and access to 22 nm technology nodes outlook.Read More
Publication Year: 2009
Publication Date: 2009-01-01
Language: en
Type: article
Access and Citation
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot