Get quick answers to your questions about the article from our AI researcher chatbot
{'id': 'https://openalex.org/W2546835363', 'doi': None, 'title': 'Step out of the light [Electronics lithography]', 'display_name': 'Step out of the light [Electronics lithography]', 'publication_year': 2013, 'publication_date': '2013-09-30', 'ids': {'openalex': 'https://openalex.org/W2546835363', 'mag': '2546835363'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'http://ieeexplore.ieee.org/iel5/10908/5648706/05659712.pdf', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S174098469', 'display_name': 'Engineering & Technology', 'issn_l': '1750-9637', 'issn': ['1750-9637', '1750-9645'], 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310311714', 'host_organization_name': 'Institution of Engineering and Technology', 'host_organization_lineage': ['https://openalex.org/P4310311714'], 'host_organization_lineage_names': ['Institution of Engineering and Technology'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': [], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5111577518', 'display_name': 'Chris Edwards', 'orcid': None}, 'institutions': [], 'countries': [], 'is_corresponding': False, 'raw_author_name': 'Chris Edwards', 'raw_affiliation_strings': [], 'affiliations': []}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5076304831', 'display_name': 'Joe Sawicki', 'orcid': None}, 'institutions': [], 'countries': [], 'is_corresponding': False, 'raw_author_name': 'Joe Sawicki', 'raw_affiliation_strings': [], 'affiliations': []}], 'institution_assertions': [], 'countries_distinct_count': 0, 'institutions_distinct_count': 0, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.0, 'has_fulltext': False, 'cited_by_count': 0, 'citation_normalized_percentile': {'value': 0.0, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 0, 'max': 65}, 'biblio': {'volume': '5', 'issue': '17', 'first_page': '34', 'last_page': '35'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.3057, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.3057, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/computational-lithography', 'display_name': 'Computational lithography', 'score': 0.46655366}, {'id': 'https://openalex.org/keywords/next-generation-lithography', 'display_name': 'Next-generation lithography', 'score': 0.4198296}], 'concepts': [{'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.75501007}, {'id': 'https://openalex.org/C138331895', 'wikidata': 'https://www.wikidata.org/wiki/Q11650', 'display_name': 'Electronics', 'level': 2, 'score': 0.6506838}, {'id': 'https://openalex.org/C182873914', 'wikidata': 'https://www.wikidata.org/wiki/Q5157329', 'display_name': 'Computational lithography', 'level': 5, 'score': 0.46655366}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.46557114}, {'id': 'https://openalex.org/C163581340', 'wikidata': 'https://www.wikidata.org/wiki/Q1983848', 'display_name': 'Next-generation lithography', 'level': 5, 'score': 0.4198296}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.38093323}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.31635526}, {'id': 'https://openalex.org/C127413603', 'wikidata': 'https://www.wikidata.org/wiki/Q11023', 'display_name': 'Engineering', 'level': 0, 'score': 0.31095386}, {'id': 'https://openalex.org/C200274948', 'wikidata': 'https://www.wikidata.org/wiki/Q256845', 'display_name': 'Electron-beam lithography', 'level': 4, 'score': 0.3087851}, {'id': 'https://openalex.org/C119599485', 'wikidata': 'https://www.wikidata.org/wiki/Q43035', 'display_name': 'Electrical engineering', 'level': 1, 'score': 0.28772286}, {'id': 'https://openalex.org/C177409738', 'wikidata': 'https://www.wikidata.org/wiki/Q1917460', 'display_name': 'Multiple patterning', 'level': 4, 'score': 0.27892303}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.19869584}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'http://ieeexplore.ieee.org/iel5/10908/5648706/05659712.pdf', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S174098469', 'display_name': 'Engineering & Technology', 'issn_l': '1750-9637', 'issn': ['1750-9637', '1750-9645'], 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310311714', 'host_organization_name': 'Institution of Engineering and Technology', 'host_organization_lineage': ['https://openalex.org/P4310311714'], 'host_organization_lineage_names': ['Institution of Engineering and Technology'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [{'id': 'https://metadata.un.org/sdg/4', 'display_name': 'Quality education', 'score': 0.4}], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W3145218145', 'https://openalex.org/W3145130709', 'https://openalex.org/W3144035318', 'https://openalex.org/W3141157327', 'https://openalex.org/W2911554158', 'https://openalex.org/W2862856357', 'https://openalex.org/W2853870770', 'https://openalex.org/W2850151953', 'https://openalex.org/W2841010242', 'https://openalex.org/W2788656524', 'https://openalex.org/W2757803263', 'https://openalex.org/W2746506921', 'https://openalex.org/W2735970705', 'https://openalex.org/W2622020704', 'https://openalex.org/W2579009905', 'https://openalex.org/W2483698514', 'https://openalex.org/W2379570117', 'https://openalex.org/W2379154773', 'https://openalex.org/W2139860506', 'https://openalex.org/W1992826285'], 'abstract_inverted_index': None, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2546835363', 'counts_by_year': [], 'updated_date': '2024-12-08T02:15:54.376714', 'created_date': '2016-11-11'}