Review of technology for 157-nm lithography

Name: Work Video:
Duration: 3 min 30 s
Description: This paper outlines the critical issues facing the implementation of 157-nm lithography as a sub-100-nm technology. The status of the present technology for mask materials, pellicles, optical materials, coatings, and resists is presented.
A. K. Bates; M. Rothschild; T. M. Bloomstein; T. H. Fedynyshyn; Roderick R. Kunz; Vladimir Liberman; M. Switkes
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