Publication Information

{'id': 'https://openalex.org/W1969950320', 'doi': 'https://doi.org/10.1117/12.534507', 'title': 'Immersion lithography and its impact on semiconductor manufacturing', 'display_name': 'Immersion lithography and its impact on semiconductor manufacturing', 'publication_year': 2004, 'publication_date': '2004-05-28', 'ids': {'openalex': 'https://openalex.org/W1969950320', 'doi': 'https://doi.org/10.1117/12.534507', 'mag': '1969950320'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1117/12.534507', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S183492911', 'display_name': 'Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE', 'issn_l': '0277-786X', 'issn': ['0277-786X', '1996-756X'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'proceedings-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5102094091', 'display_name': 'B. N. Lin', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I4210120917', 'display_name': 'Taiwan Semiconductor Manufacturing Company (Taiwan)', 'ror': 'https://ror.org/02wx79d08', 'country_code': 'TW', 'type': 'company', 'lineage': ['https://openalex.org/I4210120917']}], 'countries': ['TW'], 'is_corresponding': True, 'raw_author_name': 'Burn-Jeng Lin', 'raw_affiliation_strings': ['Taiwan Semiconductor Manufacturing Co Ltd, Taiwan'], 'affiliations': [{'raw_affiliation_string': 'Taiwan Semiconductor Manufacturing Co Ltd, Taiwan', 'institution_ids': ['https://openalex.org/I4210120917']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': ['https://openalex.org/A5102094091'], 'corresponding_institution_ids': ['https://openalex.org/I4210120917'], 'apc_list': None, 'apc_paid': None, 'fwci': 2.017, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 22, 'citation_normalized_percentile': {'value': 0.841714, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 87, 'max': 88}, 'biblio': {'volume': None, 'issue': None, 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 1.0, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 1.0, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T14117', 'display_name': 'Integrated Circuits and Semiconductor Failure Analysis', 'score': 0.9992, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11583', 'display_name': 'Advanced Measurement and Metrology Techniques', 'score': 0.9968, 'subfield': {'id': 'https://openalex.org/subfields/2210', 'display_name': 'Mechanical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/immersion-lithography', 'display_name': 'Immersion lithography', 'score': 0.97026193}, {'id': 'https://openalex.org/keywords/extreme-ultraviolet-lithography', 'display_name': 'Extreme Ultraviolet Lithography', 'score': 0.69523036}, {'id': 'https://openalex.org/keywords/immersion', 'display_name': 'Immersion', 'score': 0.63101226}, {'id': 'https://openalex.org/keywords/next-generation-lithography', 'display_name': 'Next-generation lithography', 'score': 0.61517364}, {'id': 'https://openalex.org/keywords/photoresist', 'display_name': 'Photoresist', 'score': 0.60937476}, {'id': 'https://openalex.org/keywords/computational-lithography', 'display_name': 'Computational lithography', 'score': 0.43861213}], 'concepts': [{'id': 'https://openalex.org/C94263209', 'wikidata': 'https://www.wikidata.org/wiki/Q1076175', 'display_name': 'Immersion lithography', 'level': 4, 'score': 0.97026193}, {'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.832581}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.7407632}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.7333567}, {'id': 'https://openalex.org/C162996421', 'wikidata': 'https://www.wikidata.org/wiki/Q371965', 'display_name': 'Extreme ultraviolet lithography', 'level': 2, 'score': 0.69523036}, {'id': 'https://openalex.org/C199068039', 'wikidata': 'https://www.wikidata.org/wiki/Q574523', 'display_name': 'Immersion (mathematics)', 'level': 2, 'score': 0.63101226}, {'id': 'https://openalex.org/C163581340', 'wikidata': 'https://www.wikidata.org/wiki/Q1983848', 'display_name': 'Next-generation lithography', 'level': 5, 'score': 0.61517364}, {'id': 'https://openalex.org/C134406635', 'wikidata': 'https://www.wikidata.org/wiki/Q1439684', 'display_name': 'Photoresist', 'level': 3, 'score': 0.60937476}, {'id': 'https://openalex.org/C105487726', 'wikidata': 'https://www.wikidata.org/wiki/Q622938', 'display_name': 'Photolithography', 'level': 2, 'score': 0.59893566}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.5903992}, {'id': 'https://openalex.org/C182873914', 'wikidata': 'https://www.wikidata.org/wiki/Q5157329', 'display_name': 'Computational lithography', 'level': 5, 'score': 0.43861213}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.43437088}, {'id': 'https://openalex.org/C177409738', 'wikidata': 'https://www.wikidata.org/wiki/Q1917460', 'display_name': 'Multiple patterning', 'level': 4, 'score': 0.42935693}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.3120606}, {'id': 'https://openalex.org/C200274948', 'wikidata': 'https://www.wikidata.org/wiki/Q256845', 'display_name': 'Electron-beam lithography', 'level': 4, 'score': 0.24383298}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.12048474}, {'id': 'https://openalex.org/C33923547', 'wikidata': 'https://www.wikidata.org/wiki/Q395', 'display_name': 'Mathematics', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C202444582', 'wikidata': 'https://www.wikidata.org/wiki/Q837863', 'display_name': 'Pure mathematics', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1117/12.534507', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S183492911', 'display_name': 'Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE', 'issn_l': '0277-786X', 'issn': ['0277-786X', '1996-756X'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W2606576291', 'https://openalex.org/W2115795789', 'https://openalex.org/W2032413298', 'https://openalex.org/W2025251804', 'https://openalex.org/W1991236041', 'https://openalex.org/W1988961408', 'https://openalex.org/W1977820409', 'https://openalex.org/W1975854055', 'https://openalex.org/W1973384065', 'https://openalex.org/W1967752359'], 'abstract_inverted_index': {'ArF': [0, 77], 'lithography': [1, 11, 31, 78, 212], 'is': [2, 49, 196], 'approaching': [3], 'its': [4], 'limit': [5], 'past': [6], 'the': [7, 22, 55, 63, 74, 83, 88, 92, 124, 142, 159, 172, 193, 202, 205], '90-nm': [8], 'node.': [9, 24], 'F<sub>2</sub>': [10, 30, 56], 'using': [12, 79, 178], '157-nm': [13, 190], 'light': [14], 'seems': [15], 'to': [16, 21, 95, 146, 157, 192, 201, 209], 'be': [17, 216], 'a': [18, 114, 133], 'natural': [19], 'extension': [20], 'next': [23], 'However,': [25], 'several': [26], 'key': [27], 'problems': [28], 'in': [29, 104, 132, 155], 'are': [32, 153], 'still': [33, 66], 'insurmountable.': [34], 'The': [35, 45, 186], 'thin-film': [36], 'pellicle': [37, 47], 'material': [38, 65], 'cannot': [39], 'withstand': [40], 'more': [41], 'than': [42], '10': [43], 'exposures.': [44], 'hard': [46], 'technology': [48], 'far': [50], 'from': [51, 68], 'manufacture-worthy.': [52], 'Ditto': [53], 'for': [54, 102, 171], 'resist': [57], 'systems.': [58, 185], 'Despite': [59], 'great': [60], 'progresses': [61], 'made,': [62], 'CaF<sub>2</sub>': [64], 'suffers': [67], 'quality': [69], 'and': [70, 87, 98, 106, 122, 129, 135, 148, 168, 175, 180, 183, 207], 'quantity': [71], 'problems.': [72], 'On': [73], 'other': [75], 'hand,': [76], 'water': [80], 'immersion': [81, 118, 137, 149, 184, 191], 'between': [82], 'front': [84], 'lens': [85], 'element': [86], 'photoresist,': [89], 'effectively': [90], 'reduces': [91], '193-nm': [93, 179], 'wavelength': [94], '135': [96], 'nm': [97], 'opens': [99], 'up': [100], 'rooms': [101], 'improvement': [103], 'resolution': [105], 'depth': [107], 'of': [108, 117, 144, 161, 189], 'focus': [109], '(DOF).': [110], 'This': [111], 'paper': [112], 'gives': [113], 'systematic': [115], 'examination': [116], 'lithography.': [119], 'It': [120, 139], 'analyses': [121, 141], 'evaluates': [123], 'diffraction': [125], 'DOF,': [126, 128], 'required': [127], 'available': [130], 'DOF': [131], 'dry': [134, 147, 182], 'an': [136], 'system.': [138], 'also': [140, 215], 'effects': [143], 'polarization': [145], 'imaging.': [150], 'These': [151], 'phenomena': [152], 'included': [154], 'simulations': [156], 'study': [158], 'imaging': [160, 187, 203], 'critical': [162], 'layers': [163, 170], 'such': [164], 'as': [165], 'Poly,': [166], 'Contact,': [167], 'Metal': [169], '65-nm,': [173], '45-nm,': [174], '32-nm': [176], 'nodes': [177], '157-nm,': [181], 'feasibility': [188], '22-nm': [194], 'node': [195], 'briefly': [197], 'studied.': [198], 'In': [199], 'additions': [200], 'comparison,': [204], 'impacts': [206], 'challenges': [208], 'employ': [210], 'these': [211], 'systems': [213], 'will': [214], 'covered.': [217]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W1969950320', 'counts_by_year': [{'year': 2023, 'cited_by_count': 1}, {'year': 2022, 'cited_by_count': 1}, {'year': 2016, 'cited_by_count': 3}, {'year': 2014, 'cited_by_count': 2}, {'year': 2013, 'cited_by_count': 1}], 'updated_date': '2025-01-07T00:29:04.032280', 'created_date': '2016-06-24'}