Abstract:Optical lithography, also known as UV lithography or photolithography, uses UV lamps or UV lasers to expose photosensitive film through photomasks. This chapter presents the lithography process step b...Optical lithography, also known as UV lithography or photolithography, uses UV lamps or UV lasers to expose photosensitive film through photomasks. This chapter presents the lithography process step by step as the wafer sees it. It discusses the working mechanisms of photoresists in more detail. Resists have three main components: base resin, photoactive compound (PAC) and solvent. Spin coating is a very widely used method for photoresist spinning and polymer deposition in general. Alignment needs to be evaluated over a long time: device fabrication processes take weeks or even months. Thicker resists require larger exposure doses, and the times can be even minutes. Many lithography parameters change and drift over time, including resist thickness, exposure energy, and many more. There are four basic shapes that have to be patterned: line, trench, hole and dot. Controlled Vocabulary Terms masks; photolithography; photoresists; resins; spin coatingRead More
Publication Year: 2010
Publication Date: 2010-09-17
Language: en
Type: other
Indexed In: ['crossref']
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Cited By Count: 1
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