Publication Information

{'id': 'https://openalex.org/W2486040343', 'doi': 'https://doi.org/10.1117/3.820233', 'title': 'Advanced Processes for 193-nm Immersion Lithography', 'display_name': 'Advanced Processes for 193-nm Immersion Lithography', 'publication_year': 2009, 'publication_date': '2009-02-19', 'ids': {'openalex': 'https://openalex.org/W2486040343', 'doi': 'https://doi.org/10.1117/3.820233', 'mag': '2486040343'}, 'language': 'en', 'primary_location': {'is_oa': True, 'landing_page_url': 'https://doi.org/10.1117/3.820233', 'pdf_url': 'https://www.spiedigitallibrary.org/samples/PM189.pdf', 'source': {'id': 'https://openalex.org/S4306463935', 'display_name': 'SPIE eBooks', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'ebook platform'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, 'type': 'book', 'type_crossref': 'book', 'indexed_in': ['crossref'], 'open_access': {'is_oa': True, 'oa_status': 'bronze', 'oa_url': 'https://www.spiedigitallibrary.org/samples/PM189.pdf', 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5110765717', 'display_name': 'Yayi Wei', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I109010114', 'display_name': 'SunEdison (United States)', 'ror': 'https://ror.org/00w32k615', 'country_code': 'US', 'type': 'company', 'lineage': ['https://openalex.org/I109010114']}], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'Yayi Wei', 'raw_affiliation_strings': ['AZ Electronic Materials USA Corp.'], 'affiliations': [{'raw_affiliation_string': 'AZ Electronic Materials USA Corp.', 'institution_ids': ['https://openalex.org/I109010114']}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5053233504', 'display_name': 'Robert L. Brainard', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I392282', 'display_name': 'University at Albany, State University of New York', 'ror': 'https://ror.org/012zs8222', 'country_code': 'US', 'type': 'education', 'lineage': ['https://openalex.org/I392282']}], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'Robert L. Brainard', 'raw_affiliation_strings': ['Univ. at Albany'], 'affiliations': [{'raw_affiliation_string': 'Univ. at Albany', 'institution_ids': ['https://openalex.org/I392282']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 2, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 2.116, 'has_fulltext': True, 'fulltext_origin': 'pdf', 'cited_by_count': 83, 'citation_normalized_percentile': {'value': 0.99705, 'is_in_top_1_percent': True, 'is_in_top_10_percent': True}, 'cited_by_percentile_year': {'min': 96, 'max': 97}, 'biblio': {'volume': None, 'issue': None, 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9893, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9893, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T12224', 'display_name': 'Nanofabrication and Lithography Techniques', 'score': 0.9637, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/immersion-lithography', 'display_name': 'Immersion lithography', 'score': 0.83214664}, {'id': 'https://openalex.org/keywords/immersion', 'display_name': 'Immersion', 'score': 0.58970594}], 'concepts': [{'id': 'https://openalex.org/C94263209', 'wikidata': 'https://www.wikidata.org/wiki/Q1076175', 'display_name': 'Immersion lithography', 'level': 4, 'score': 0.83214664}, {'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.59294146}, {'id': 'https://openalex.org/C199068039', 'wikidata': 'https://www.wikidata.org/wiki/Q574523', 'display_name': 'Immersion (mathematics)', 'level': 2, 'score': 0.58970594}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.549816}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.2945135}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.27162343}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.13128924}, {'id': 'https://openalex.org/C33923547', 'wikidata': 'https://www.wikidata.org/wiki/Q395', 'display_name': 'Mathematics', 'level': 0, 'score': 0.07095438}, {'id': 'https://openalex.org/C2524010', 'wikidata': 'https://www.wikidata.org/wiki/Q8087', 'display_name': 'Geometry', 'level': 1, 'score': 0.044605136}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': True, 'landing_page_url': 'https://doi.org/10.1117/3.820233', 'pdf_url': 'https://www.spiedigitallibrary.org/samples/PM189.pdf', 'source': {'id': 'https://openalex.org/S4306463935', 'display_name': 'SPIE eBooks', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'ebook platform'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}], 'best_oa_location': {'is_oa': True, 'landing_page_url': 'https://doi.org/10.1117/3.820233', 'pdf_url': 'https://www.spiedigitallibrary.org/samples/PM189.pdf', 'source': {'id': 'https://openalex.org/S4306463935', 'display_name': 'SPIE eBooks', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310315543', 'host_organization_name': 'SPIE', 'host_organization_lineage': ['https://openalex.org/P4310315543'], 'host_organization_lineage_names': ['SPIE'], 'type': 'ebook platform'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W2953320963', 'https://openalex.org/W2933347854', 'https://openalex.org/W2095338410', 'https://openalex.org/W2090701805', 'https://openalex.org/W2054704405', 'https://openalex.org/W2039278241', 'https://openalex.org/W2015326664', 'https://openalex.org/W2000319998', 'https://openalex.org/W1994893003', 'https://openalex.org/W1978807668'], 'abstract_inverted_index': {'Resist': [0], 'Leaching': [1], 'and': [2, 21, 47, 65, 77, 103, 119, 126, 177], 'Water': [3], 'UptakeOne': [4], 'unique': [5], 'aspect': [6], 'of': [7, 13, 52, 80, 92, 96, 106, 128], '193i': [8], 'lithography': [9], 'is': [10, 33], 'the': [11, 17, 22, 31, 40, 53, 63, 75, 81, 90, 100, 104, 110, 117, 122, 132, 135, 148], 'use': [12], 'water': [14, 38, 64, 71, 114, 129, 179], 'situated': [15], 'between': [16], 'final': [18], 'lens': [19, 76, 111, 171], 'element': [20], 'resist.The': [23], 'resist': [24, 54, 68, 93, 123, 136, 175, 182], 'stack': [25], '(with': [26], 'or': [27, 134], 'without': [28], 'topcoat)': [29], 'on': [30, 109], 'wafer': [32, 78], 'dynamically': [34], 'exposed': [35], 'through': [36], 'this': [37, 58], 'with': [39, 160], 'step-and-scan': [41], 'process.The': [42], 'photoacid': [43], 'generator': [44], '(PAG),': [45], 'quencher,': [46], 'other': [48], 'small': [49], 'molecular': [50], 'components': [51, 61], 'may': [55, 66], 'leach': [56], 'into': [57, 121], 'water.These': [59], 'leached': [60, 97, 168], 'contaminate': [62, 74], 'degrade': [67], 'performance.This': [69, 144], 'contaminated': [70], 'can': [72, 115, 130], 'additionally': [73], 'stage': [79], 'scanner.To': [82], 'master': [83], 'these': [84, 107], 'leaching': [85, 152, 156, 159], 'problems,': [86], 'we': [87], 'must': [88], 'understand': [89], 'dynamics': [91], 'leaching,': [94, 176], 'transportation': [95], 'contaminates': [98], 'in': [99, 181], 'immersion': [101], 'water,': [102], 'impact': [105], 'contaminants': [108], 'during': [112], 'exposure.Additionally,': [113], 'penetrate': [116], 'topcoat': [118, 133], 'diffuse': [120], 'film.This': [124], 'penetration': [125], 'diffusion': [127], 'cause': [131], 'to': [137, 165], 'swell,': [138], 'which': [139], 'will': [140], 'affect': [141], 'their': [142], 'lithographic': [143], 'chapter': [145], 'specifically': [146], 'addresses': [147], 'following': [149], 'issues:': [150], '(1)': [151], 'test': [153], 'methods,': [154], '(2)': [155], 'dynamics,': [157], '(3)': [158], '193-nm': [161], 'exposure,': [162], '(4)': [163], 'pre-rinse': [164], 'partially': [166], 'remove': [167], 'contaminants,': [169], '(5)': [170], 'contamination': [172], 'caused': [173], 'by': [174], '(6)': [178], 'uptake': [180], 'film.': [183]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2486040343', 'counts_by_year': [{'year': 2024, 'cited_by_count': 2}, {'year': 2023, 'cited_by_count': 4}, {'year': 2022, 'cited_by_count': 1}, {'year': 2021, 'cited_by_count': 5}, {'year': 2020, 'cited_by_count': 2}, {'year': 2019, 'cited_by_count': 6}, {'year': 2018, 'cited_by_count': 6}, {'year': 2017, 'cited_by_count': 6}, {'year': 2016, 'cited_by_count': 6}, {'year': 2015, 'cited_by_count': 7}, {'year': 2014, 'cited_by_count': 7}, {'year': 2013, 'cited_by_count': 9}, {'year': 2012, 'cited_by_count': 7}], 'updated_date': '2025-01-09T10:55:59.227220', 'created_date': '2016-08-23'}