Title: Key technology of mask making for 50 nm X-ray lithography
Abstract:The X-ray lithography of 1 nm wavelength is a step lithography. Compared to other next-generation lithography alternatives, the X-ray lithography can improve resolution, depth of focus, and exposure f...The X-ray lithography of 1 nm wavelength is a step lithography. Compared to other next-generation lithography alternatives, the X-ray lithography can improve resolution, depth of focus, and exposure field sizes simultaneously. Another key advantage is the low cost. As the most difficult part of the X-ray lithography, the mask making technology for 50 nm X-ray lithography was discussed in this paper.Read More
Publication Year: 2004
Publication Date: 2004-01-01
Language: en
Type: article
Access and Citation
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot