Title: <title>Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography</title>
Abstract:A low-cost mask fabrication process for deep x-ray lithography is described. The mask consists of Kapton films stretched on a ring with absorber structures formed by optical lithography using NFR015 r...A low-cost mask fabrication process for deep x-ray lithography is described. The mask consists of Kapton films stretched on a ring with absorber structures formed by optical lithography using NFR015 resist and gold electroplating, similar to the masks from the 'early x-ray lithography age'. Such masks proved easy to fabricate and are presently being evaluated for deep x-ray lithography applications. First experiments indicate that they exhibit sufficient radiation resistance and limited variational dimensional changes during exposure at 1.3-1.5 GeV on the XRLM3 beamline at CAMD.Read More
Publication Year: 1997
Publication Date: 1997-09-02
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 3
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot