Publication Information

{'id': 'https://openalex.org/W2162159501', 'doi': 'https://doi.org/10.1109/icemi.2007.4351131', 'title': 'Optical interferometry Endpoint Detection for Plasma Etching', 'display_name': 'Optical interferometry Endpoint Detection for Plasma Etching', 'publication_year': 2007, 'publication_date': '2007-08-01', 'ids': {'openalex': 'https://openalex.org/W2162159501', 'doi': 'https://doi.org/10.1109/icemi.2007.4351131', 'mag': '2162159501'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1109/icemi.2007.4351131', 'pdf_url': None, 'source': None, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'proceedings-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5045041919', 'display_name': 'Wei Wang', 'orcid': 'https://orcid.org/0000-0002-7610-0126'}, 'institutions': [{'id': 'https://openalex.org/I10535382', 'display_name': 'Chongqing University of Posts and Telecommunications', 'ror': 'https://ror.org/03dgaqz26', 'country_code': 'CN', 'type': 'education', 'lineage': ['https://openalex.org/I10535382']}], 'countries': ['CN'], 'is_corresponding': False, 'raw_author_name': 'Wang Wei', 'raw_affiliation_strings': ['College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing, China'], 'affiliations': [{'raw_affiliation_string': 'College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing, China', 'institution_ids': ['https://openalex.org/I10535382']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5113881707', 'display_name': 'Zhongwen Lan', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I150229711', 'display_name': 'University of Electronic Science and Technology of China', 'ror': 'https://ror.org/04qr3zq92', 'country_code': 'CN', 'type': 'education', 'lineage': ['https://openalex.org/I150229711']}], 'countries': ['CN'], 'is_corresponding': False, 'raw_author_name': 'Lan Zhongwen', 'raw_affiliation_strings': ['College of Microelectronics and Solid State Electronics, UESTC, Chengdu, China'], 'affiliations': [{'raw_affiliation_string': 'College of Microelectronics and Solid State Electronics, UESTC, Chengdu, China', 'institution_ids': ['https://openalex.org/I150229711']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5112426775', 'display_name': 'Wen Yuan Wu', 'orcid': None}, 'institutions': [], 'countries': ['CN'], 'is_corresponding': False, 'raw_author_name': 'Wen Wu', 'raw_affiliation_strings': ['Chongqing Chongyou Information Technology Company Limited, Chongqing, China'], 'affiliations': [{'raw_affiliation_string': 'Chongqing Chongyou Information Technology Company Limited, Chongqing, China', 'institution_ids': []}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5068798651', 'display_name': 'Yungui Gong', 'orcid': 'https://orcid.org/0000-0001-5065-2259'}, 'institutions': [{'id': 'https://openalex.org/I10535382', 'display_name': 'Chongqing University of Posts and Telecommunications', 'ror': 'https://ror.org/03dgaqz26', 'country_code': 'CN', 'type': 'education', 'lineage': ['https://openalex.org/I10535382']}], 'countries': ['CN'], 'is_corresponding': False, 'raw_author_name': 'Gong Yungui', 'raw_affiliation_strings': ['College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing, China'], 'affiliations': [{'raw_affiliation_string': 'College of Electronics Engineering, Chongqing University of Posts and Telecommunications, Chongqing, China', 'institution_ids': ['https://openalex.org/I10535382']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 2, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.39, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 5, 'citation_normalized_percentile': {'value': 0.628002, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 78, 'max': 79}, 'biblio': {'volume': None, 'issue': None, 'first_page': '4', 'last_page': '255'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T10781', 'display_name': 'Plasma Diagnostics and Applications', 'score': 0.9795, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T10781', 'display_name': 'Plasma Diagnostics and Applications', 'score': 0.9795, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T13049', 'display_name': 'Surface Roughness and Optical Measurements', 'score': 0.9493, 'subfield': {'id': 'https://openalex.org/subfields/2206', 'display_name': 'Computational Mechanics'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11301', 'display_name': 'Advanced Surface Polishing Techniques', 'score': 0.948, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.7732024}], 'concepts': [{'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.8737579}, {'id': 'https://openalex.org/C166689943', 'wikidata': 'https://www.wikidata.org/wiki/Q850283', 'display_name': 'Interferometry', 'level': 2, 'score': 0.7767758}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.7732024}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.72516745}, {'id': 'https://openalex.org/C544956773', 'wikidata': 'https://www.wikidata.org/wiki/Q670', 'display_name': 'Silicon', 'level': 2, 'score': 0.5853539}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.57463396}, {'id': 'https://openalex.org/C82706917', 'wikidata': 'https://www.wikidata.org/wiki/Q10251', 'display_name': 'Plasma', 'level': 2, 'score': 0.5739396}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.51732445}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.511287}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.5008793}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.19419375}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.09764832}, {'id': 'https://openalex.org/C62520636', 'wikidata': 'https://www.wikidata.org/wiki/Q944', 'display_name': 'Quantum mechanics', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1109/icemi.2007.4351131', 'pdf_url': None, 'source': None, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 6, 'referenced_works': ['https://openalex.org/W1708366040', 'https://openalex.org/W1949420127', 'https://openalex.org/W1980834751', 'https://openalex.org/W2022479083', 'https://openalex.org/W2048279348', 'https://openalex.org/W2116910202'], 'related_works': ['https://openalex.org/W2765886561', 'https://openalex.org/W2466887265', 'https://openalex.org/W2093286625', 'https://openalex.org/W2089438580', 'https://openalex.org/W2082133582', 'https://openalex.org/W2051018996', 'https://openalex.org/W2035159056', 'https://openalex.org/W2023718213', 'https://openalex.org/W2001988991', 'https://openalex.org/W1332446'], 'abstract_inverted_index': {'The': [0, 22, 55, 78], 'optical': [1, 26, 42, 70], 'interferometry': [2, 71], 'is': [3, 38, 76], 'a': [4, 15], 'non-invasive': [5], 'plasma': [6, 18, 33, 61, 92], 'diagnostic': [7], 'method.': [8], 'Etch': [9], 'experiment': [10], 'were': [11], 'carried': [12], 'out': [13], 'in': [14, 32, 89], 'high': [16, 90], 'density': [17, 91], 'etching': [19, 34, 88, 93], 'tool': [20], '(ICP).': [21], 'theoretical': [23], 'model': [24], 'for': [25], 'interferometric': [27, 53], 'endpoint': [28, 56, 79], 'detection': [29], 'and': [30, 47, 58], 'prediction': [31, 80], 'are': [35, 64], 'presented.': [36], 'It': [37], 'observed': [39], 'that': [40], 'the': [41, 52, 73], 'properties': [43], 'of': [44], 'oxide': [45], 'layer': [46, 49], 'polysilicon': [48], 'can': [50], 'affect': [51], 'signals.': [54], 'algorithm': [57], 'real': [59], 'time': [60], 'parameters': [62], 'diagnostics': [63], 'discussed,': [65], 'then': [66], 'process': [67], 'control': [68], 'with': [69], 'during': [72], 'poly-silicon': [74, 86], 'etch': [75], 'described.': [77], 'technique': [81], 'has': [82], 'been': [83], 'applied': [84], 'to': [85], 'gate': [87], 'tools.': [94]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2162159501', 'counts_by_year': [{'year': 2016, 'cited_by_count': 2}, {'year': 2014, 'cited_by_count': 1}, {'year': 2013, 'cited_by_count': 1}], 'updated_date': '2024-12-08T15:44:45.374920', 'created_date': '2016-06-24'}