Get quick answers to your questions about the article from our AI researcher chatbot
{'id': 'https://openalex.org/W2765886561', 'doi': 'https://doi.org/10.1116/1.4998480', 'title': 'Chromium oxide as a hard mask material better than metallic chromium', 'display_name': 'Chromium oxide as a hard mask material better than metallic chromium', 'publication_year': 2017, 'publication_date': '2017-10-30', 'ids': {'openalex': 'https://openalex.org/W2765886561', 'doi': 'https://doi.org/10.1116/1.4998480', 'mag': '2765886561'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1116/1.4998480', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S4210235835', 'display_name': 'Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena', 'issn_l': '2166-2746', 'issn': ['2166-2746', '2166-2754'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': None, 'host_organization_name': None, 'host_organization_lineage': [], 'host_organization_lineage_names': [], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5084169031', 'display_name': 'Ferhat Aydinoglu', 'orcid': 'https://orcid.org/0000-0002-9740-2617'}, 'institutions': [{'id': 'https://openalex.org/I151746483', 'display_name': 'University of Waterloo', 'ror': 'https://ror.org/01aff2v68', 'country_code': 'CA', 'type': 'education', 'lineage': ['https://openalex.org/I151746483']}], 'countries': ['CA'], 'is_corresponding': False, 'raw_author_name': 'Ferhat Aydinoglu', 'raw_affiliation_strings': ['Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada'], 'affiliations': [{'raw_affiliation_string': 'Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada', 'institution_ids': ['https://openalex.org/I151746483']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5056063694', 'display_name': 'Fayçal Saffih', 'orcid': 'https://orcid.org/0000-0002-8226-1217'}, 'institutions': [{'id': 'https://openalex.org/I151746483', 'display_name': 'University of Waterloo', 'ror': 'https://ror.org/01aff2v68', 'country_code': 'CA', 'type': 'education', 'lineage': ['https://openalex.org/I151746483']}], 'countries': ['CA'], 'is_corresponding': False, 'raw_author_name': 'Faycal Saffih', 'raw_affiliation_strings': ['Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada'], 'affiliations': [{'raw_affiliation_string': 'Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada', 'institution_ids': ['https://openalex.org/I151746483']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5045348450', 'display_name': 'Ripon Kumar Dey', 'orcid': 'https://orcid.org/0000-0001-9252-9865'}, 'institutions': [{'id': 'https://openalex.org/I151746483', 'display_name': 'University of Waterloo', 'ror': 'https://ror.org/01aff2v68', 'country_code': 'CA', 'type': 'education', 'lineage': ['https://openalex.org/I151746483']}], 'countries': ['CA'], 'is_corresponding': False, 'raw_author_name': 'Ripon Kumar Dey', 'raw_affiliation_strings': ['Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada'], 'affiliations': [{'raw_affiliation_string': 'Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada', 'institution_ids': ['https://openalex.org/I151746483']}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5079759683', 'display_name': 'Bo Cui', 'orcid': 'https://orcid.org/0000-0003-3222-3826'}, 'institutions': [{'id': 'https://openalex.org/I151746483', 'display_name': 'University of Waterloo', 'ror': 'https://ror.org/01aff2v68', 'country_code': 'CA', 'type': 'education', 'lineage': ['https://openalex.org/I151746483']}], 'countries': ['CA'], 'is_corresponding': False, 'raw_author_name': 'Bo Cui', 'raw_affiliation_strings': ['Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada'], 'affiliations': [{'raw_affiliation_string': 'Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo , Waterloo, Ontario N2L 3G1, Canada', 'institution_ids': ['https://openalex.org/I151746483']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.319, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 13, 'citation_normalized_percentile': {'value': 0.618422, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 87, 'max': 88}, 'biblio': {'volume': '35', 'issue': '6', 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9998, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9998, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10377', 'display_name': 'Metal and Thin Film Mechanics', 'score': 0.9993, 'subfield': {'id': 'https://openalex.org/subfields/2211', 'display_name': 'Mechanics of Materials'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9992, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/dry-etching', 'display_name': 'Dry etching', 'score': 0.7626587}, {'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.66373855}], 'concepts': [{'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.9388928}, {'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.87697065}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.84567285}, {'id': 'https://openalex.org/C1291036', 'wikidata': 'https://www.wikidata.org/wiki/Q1191918', 'display_name': 'Dry etching', 'level': 4, 'score': 0.7626587}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.66373855}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.65212286}, {'id': 'https://openalex.org/C2777289219', 'wikidata': 'https://www.wikidata.org/wiki/Q7632154', 'display_name': 'Substrate (aquarium)', 'level': 2, 'score': 0.6509361}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.629085}, {'id': 'https://openalex.org/C544956773', 'wikidata': 'https://www.wikidata.org/wiki/Q670', 'display_name': 'Silicon', 'level': 2, 'score': 0.6230266}, {'id': 'https://openalex.org/C511782168', 'wikidata': 'https://www.wikidata.org/wiki/Q725', 'display_name': 'Chromium', 'level': 2, 'score': 0.4330983}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.3937779}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.33362174}, {'id': 'https://openalex.org/C191897082', 'wikidata': 'https://www.wikidata.org/wiki/Q11467', 'display_name': 'Metallurgy', 'level': 1, 'score': 0.21671817}, {'id': 'https://openalex.org/C127313418', 'wikidata': 'https://www.wikidata.org/wiki/Q1069', 'display_name': 'Geology', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C111368507', 'wikidata': 'https://www.wikidata.org/wiki/Q43518', 'display_name': 'Oceanography', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1116/1.4998480', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S4210235835', 'display_name': 'Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena', 'issn_l': '2166-2746', 'issn': ['2166-2746', '2166-2754'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': None, 'host_organization_name': None, 'host_organization_lineage': [], 'host_organization_lineage_names': [], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [{'funder': 'https://openalex.org/F4320319952', 'funder_display_name': 'Canada Foundation for Innovation', 'award_id': None}, {'funder': 'https://openalex.org/F4320321716', 'funder_display_name': 'Industry Canada', 'award_id': None}, {'funder': 'https://openalex.org/F4320321886', 'funder_display_name': 'Ontario Ministry of Research, Innovation and Science', 'award_id': None}], 'datasets': [], 'versions': [], 'referenced_works_count': 22, 'referenced_works': ['https://openalex.org/W1785877937', 'https://openalex.org/W1975772894', 'https://openalex.org/W1978504608', 'https://openalex.org/W1996501233', 'https://openalex.org/W2000947232', 'https://openalex.org/W2002725389', 'https://openalex.org/W2003288341', 'https://openalex.org/W2011999766', 'https://openalex.org/W2022555030', 'https://openalex.org/W2026224585', 'https://openalex.org/W2028664220', 'https://openalex.org/W2043568241', 'https://openalex.org/W2049605280', 'https://openalex.org/W2056009271', 'https://openalex.org/W2062419712', 'https://openalex.org/W2078639662', 'https://openalex.org/W2083003726', 'https://openalex.org/W2086892109', 'https://openalex.org/W2087063898', 'https://openalex.org/W2094822723', 'https://openalex.org/W2129859200', 'https://openalex.org/W2539202396'], 'related_works': ['https://openalex.org/W4387743859', 'https://openalex.org/W2990622264', 'https://openalex.org/W2765886561', 'https://openalex.org/W2542354647', 'https://openalex.org/W2495723748', 'https://openalex.org/W2094633807', 'https://openalex.org/W2082133582', 'https://openalex.org/W2070736010', 'https://openalex.org/W1991288435', 'https://openalex.org/W19452786'], 'abstract_inverted_index': {'In': [0, 107], 'nanofabrication,': [1], 'use': [2, 39], 'of': [3, 62, 71, 99, 193], 'thin': [4, 15], 'resist': [5, 16, 26, 105, 145], 'is': [6, 37, 60, 80, 140, 199], 'required': [7], 'to': [8, 30, 38, 75, 90, 103, 142], 'achieve': [9], 'very': [10], 'high': [11, 73], 'resolution': [12], 'features.': [13], 'But': [14], 'makes': [17], 'pattern': [18, 47, 146, 155, 209], 'transferring': [19, 156, 210], 'by': [20, 136], 'dry': [21, 212], 'etching': [22, 67, 79, 94, 169, 189], 'difficult': [23], 'because': [24, 70, 132], 'typical': [25], 'has': [27], 'poor': [28], 'resistance': [29, 74, 190], 'plasma': [31, 76, 213], 'etching.': [32, 77, 106, 214], 'One': [33], 'widely': [34], 'employed': [35], 'strategy': [36], 'an': [40], 'intermediate': [41], 'hard': [42, 66, 203], 'mask': [43, 68, 204], 'layer,': [44, 52], 'with': [45, 124, 170], 'the': [46, 55, 63, 92, 110, 144, 153, 158, 183, 187], 'first': [48], 'transferred': [49], 'into': [50, 54, 147, 150, 157], 'this': [51, 108], 'then': [53], 'substrate': [56, 159], 'or': [57, 87, 175], 'sublayer.': [58], 'Cr': [59, 78, 130, 174, 207], 'one': [61], 'most': [64], 'popular': [65], 'materials': [69, 185], 'its': [72], 'carried': [81], 'out': [82], 'in': [83, 119], 'O2': [84, 100], 'and': [85, 173, 191], 'Cl2': [86], 'CCl4': [88], 'environment': [89], 'form': [91], 'volatile': [93], 'product': [95], 'CrO2Cl2,': [96], 'but': [97], 'addition': [98], 'gas': [101, 122, 172], 'leads': [102], 'fast': [104], 'work,': [109], 'authors': [111], 'show': [112], 'that': [113, 182], 'Cr2O3': [114, 133, 148, 176, 198], 'can': [115], 'be': [116], 'etched': [117], 'readily': [118], 'a': [120, 200], 'Cl2/O2': [121], 'mixture': [123], 'less': [125], 'oxygen': [126, 135], 'than': [127, 149, 206], 'needed': [128], 'for': [129, 208], 'etching,': [131], 'contains': [134], 'itself.': [137], 'Thus': [138], 'it': [139, 179], 'easier': [141], 'transfer': [143], 'Cr.': [151], 'For': [152], 'subsequent': [154], 'here': [160], 'silicon': [161], 'using': [162, 211], 'nonswitching': [163], 'pseudo-Bosch': [164], 'inductively': [165], 'coupled': [166], 'plasma-reactive': [167], 'ion': [168], 'SF6/C4F8': [171], 'as': [177], 'mask,': [178], 'was': [180], 'found': [181], 'two': [184], 'have': [186], 'same': [188], 'selectivity': [192], '100:1': [194], 'over': [195], 'silicon.': [196], 'Therefore,': [197], 'more': [201], 'suitable': [202], 'material': [205]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2765886561', 'counts_by_year': [{'year': 2023, 'cited_by_count': 3}, {'year': 2022, 'cited_by_count': 3}, {'year': 2021, 'cited_by_count': 4}, {'year': 2020, 'cited_by_count': 3}], 'updated_date': '2024-12-13T17:37:50.731752', 'created_date': '2017-11-10'}