Publication Information

{'id': 'https://openalex.org/W2023718213', 'doi': 'https://doi.org/10.1063/1.4812750', 'title': 'Feasibility of atomic layer etching of polymer material based on sequential O2 exposure and Ar low-pressure plasma-etching', 'display_name': 'Feasibility of atomic layer etching of polymer material based on sequential O2 exposure and Ar low-pressure plasma-etching', 'publication_year': 2013, 'publication_date': '2013-06-24', 'ids': {'openalex': 'https://openalex.org/W2023718213', 'doi': 'https://doi.org/10.1063/1.4812750', 'mag': '2023718213'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1063/1.4812750', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S105243760', 'display_name': 'Applied Physics Letters', 'issn_l': '0003-6951', 'issn': ['0003-6951', '1077-3118', '1520-8842'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320257', 'host_organization_name': 'American Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310320257'], 'host_organization_lineage_names': ['American Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5108399295', 'display_name': 'Evelina Vogli', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I66946132', 'display_name': 'University of Maryland, College Park', 'ror': 'https://ror.org/047s2c258', 'country_code': 'US', 'type': 'education', 'lineage': ['https://openalex.org/I66946132']}], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'Evelina Vogli', 'raw_affiliation_strings': ['Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA'], 'affiliations': [{'raw_affiliation_string': 'Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA', 'institution_ids': ['https://openalex.org/I66946132']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5089034106', 'display_name': 'Dominik Metzler', 'orcid': 'https://orcid.org/0000-0001-9645-5445'}, 'institutions': [{'id': 'https://openalex.org/I66946132', 'display_name': 'University of Maryland, College Park', 'ror': 'https://ror.org/047s2c258', 'country_code': 'US', 'type': 'education', 'lineage': ['https://openalex.org/I66946132']}], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'Dominik Metzler', 'raw_affiliation_strings': ['Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA'], 'affiliations': [{'raw_affiliation_string': 'Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA', 'institution_ids': ['https://openalex.org/I66946132']}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5088251109', 'display_name': 'G. S. Oehrlein', 'orcid': 'https://orcid.org/0000-0002-6693-4274'}, 'institutions': [{'id': 'https://openalex.org/I66946132', 'display_name': 'University of Maryland, College Park', 'ror': 'https://ror.org/047s2c258', 'country_code': 'US', 'type': 'education', 'lineage': ['https://openalex.org/I66946132']}], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'Gottlieb S. Oehrlein', 'raw_affiliation_strings': ['Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA'], 'affiliations': [{'raw_affiliation_string': 'Department of Material Science and Engineering and Institute for Research in Electronics and Applied Physics, University of Maryland , College Park, Maryland 20742, USA', 'institution_ids': ['https://openalex.org/I66946132']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 2.386, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 34, 'citation_normalized_percentile': {'value': 0.933442, 'is_in_top_1_percent': False, 'is_in_top_10_percent': True}, 'cited_by_percentile_year': {'min': 93, 'max': 94}, 'biblio': {'volume': '102', 'issue': '25', 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11272', 'display_name': 'Nanowire Synthesis and Applications', 'score': 0.9994, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10558', 'display_name': 'Advancements in Semiconductor Devices and Circuit Design', 'score': 0.9984, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/polystyrene', 'display_name': 'Polystyrene', 'score': 0.7074254}, {'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.6502224}, {'id': 'https://openalex.org/keywords/dry-etching', 'display_name': 'Dry etching', 'score': 0.57379615}, {'id': 'https://openalex.org/keywords/deposition', 'display_name': 'Deposition', 'score': 0.52597874}], 'concepts': [{'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.9089011}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.8048793}, {'id': 'https://openalex.org/C2777922577', 'wikidata': 'https://www.wikidata.org/wiki/Q146243', 'display_name': 'Polystyrene', 'level': 3, 'score': 0.7074254}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.6551169}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.65317726}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.6502224}, {'id': 'https://openalex.org/C521977710', 'wikidata': 'https://www.wikidata.org/wiki/Q81163', 'display_name': 'Polymer', 'level': 2, 'score': 0.6251923}, {'id': 'https://openalex.org/C1291036', 'wikidata': 'https://www.wikidata.org/wiki/Q1191918', 'display_name': 'Dry etching', 'level': 4, 'score': 0.57379615}, {'id': 'https://openalex.org/C64297162', 'wikidata': 'https://www.wikidata.org/wiki/Q1987070', 'display_name': 'Deposition (geology)', 'level': 3, 'score': 0.52597874}, {'id': 'https://openalex.org/C113196181', 'wikidata': 'https://www.wikidata.org/wiki/Q485223', 'display_name': 'Analytical Chemistry (journal)', 'level': 2, 'score': 0.38173443}, {'id': 'https://openalex.org/C42360764', 'wikidata': 'https://www.wikidata.org/wiki/Q83588', 'display_name': 'Chemical engineering', 'level': 1, 'score': 0.35557032}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.281012}, {'id': 'https://openalex.org/C159985019', 'wikidata': 'https://www.wikidata.org/wiki/Q181790', 'display_name': 'Composite material', 'level': 1, 'score': 0.26685888}, {'id': 'https://openalex.org/C185592680', 'wikidata': 'https://www.wikidata.org/wiki/Q2329', 'display_name': 'Chemistry', 'level': 0, 'score': 0.2485123}, {'id': 'https://openalex.org/C43617362', 'wikidata': 'https://www.wikidata.org/wiki/Q170050', 'display_name': 'Chromatography', 'level': 1, 'score': 0.06544429}, {'id': 'https://openalex.org/C151730666', 'wikidata': 'https://www.wikidata.org/wiki/Q7205', 'display_name': 'Paleontology', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C2816523', 'wikidata': 'https://www.wikidata.org/wiki/Q180184', 'display_name': 'Sediment', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C127413603', 'wikidata': 'https://www.wikidata.org/wiki/Q11023', 'display_name': 'Engineering', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C86803240', 'wikidata': 'https://www.wikidata.org/wiki/Q420', 'display_name': 'Biology', 'level': 0, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1063/1.4812750', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S105243760', 'display_name': 'Applied Physics Letters', 'issn_l': '0003-6951', 'issn': ['0003-6951', '1077-3118', '1520-8842'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320257', 'host_organization_name': 'American Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310320257'], 'host_organization_lineage_names': ['American Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 21, 'referenced_works': ['https://openalex.org/W1977767698', 'https://openalex.org/W1982445548', 'https://openalex.org/W1988765359', 'https://openalex.org/W1994069792', 'https://openalex.org/W2002216049', 'https://openalex.org/W2008074288', 'https://openalex.org/W2015166835', 'https://openalex.org/W2015168690', 'https://openalex.org/W2032415425', 'https://openalex.org/W2041143206', 'https://openalex.org/W2042574896', 'https://openalex.org/W2053301477', 'https://openalex.org/W2059997046', 'https://openalex.org/W2063286727', 'https://openalex.org/W2067109550', 'https://openalex.org/W2078639662', 'https://openalex.org/W2085298536', 'https://openalex.org/W2091960953', 'https://openalex.org/W2171627649', 'https://openalex.org/W4253680319', 'https://openalex.org/W4387483006'], 'related_works': ['https://openalex.org/W4387743859', 'https://openalex.org/W2990622264', 'https://openalex.org/W2765886561', 'https://openalex.org/W2542354647', 'https://openalex.org/W2495723748', 'https://openalex.org/W2094633807', 'https://openalex.org/W2082133582', 'https://openalex.org/W2070736010', 'https://openalex.org/W1991288435', 'https://openalex.org/W19452786'], 'abstract_inverted_index': {'We': [0], 'describe': [1], 'controlled,': [2], 'self-limited': [3, 71], 'etching': [4, 12, 32, 60, 67], 'of': [5, 15, 18, 61, 74], 'a': [6, 10, 19, 27], 'polystyrene': [7], 'polymer': [8, 64], 'using': [9, 35], 'composite': [11], 'cycle': [13], 'consisting': [14], 'sequential': [16], 'deposition': [17], 'thin': [20], 'reactive': [21, 49], 'layer': [22, 50], 'from': [23, 26], 'precursors': [24], 'produced': [25], 'polymer-coated': [28], 'electrode': [29], 'within': [30], 'the': [31, 46, 62, 66], 'chamber,': [33], 'modification': [34], 'O2': [36], 'exposure,': [37], 'and': [38, 69], 'subsequent': [39], 'low-pressure': [40], 'Ar': [41], 'plasma': [42], 'etching,': [43], 'which': [44], 'removes': [45], 'oxygen-modified': [47], 'deposited': [48], 'along': [51], 'with': [52], '≈0.1': [53], 'nm': [54], 'unmodified': [55, 63], 'polymer.': [56], 'Deposition': [57], 'prevents': [58], 'net': [59], 'during': [65], 'step': [68], 'enables': [70], 'etch': [72], 'rates': [73], '0.1': [75], 'nm/cycle.': [76]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2023718213', 'counts_by_year': [{'year': 2024, 'cited_by_count': 1}, {'year': 2023, 'cited_by_count': 1}, {'year': 2022, 'cited_by_count': 3}, {'year': 2021, 'cited_by_count': 3}, {'year': 2020, 'cited_by_count': 4}, {'year': 2019, 'cited_by_count': 1}, {'year': 2018, 'cited_by_count': 4}, {'year': 2017, 'cited_by_count': 3}, {'year': 2016, 'cited_by_count': 2}, {'year': 2015, 'cited_by_count': 11}, {'year': 2013, 'cited_by_count': 1}], 'updated_date': '2024-12-13T16:03:06.666718', 'created_date': '2016-06-24'}