Title: Influence of fabrication error in ion beam etching on diffractive optical element
Abstract: According to the technical process of ion beam etching on Diffractive Optical Element (DOE), a distribution of surface error in ion beam etching was presented. The analysis of numerical simulation based on the theory of Fraunhofer of scalar diffraction was discussed. The results of analysis and experiment show that the surface distribution of etching error causes an aberrant spot of intensity obviously in the center of focal area of DOE, which consumedly reduces the uniformity of target field in uniform illumination.
Publication Year: 2007
Publication Date: 2007-01-01
Language: en
Type: article
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