Title: Study on amorphous silicon thin films deposited by DC reactive magnetron sputtering
Abstract: The amorphous silicon thin film is an important light-sensitive material that has received significant attention and been used widely in a good deal of fields.DC Reactive Magnetron Sputtering technology is an important method in depositing thin films and has some advantages such as simple technology,low deposition temperature and so on.amorphous silicon thin films is deposited on glass substrates by DC reactive magnetron sputtering technology,and annealing is carried out for amorphous silicon thin films.The dependence of deposit rate on sputtering power and air pressure is researched.The result indicates that the relation between deposit rate and sputtering power is linear.The thin films is analyzed by X-ray diffraction(XRD)and the research show that the thin film is amorphous.The thin film’s surface is observed by scan electronic microscope(SEM) and the result is accordant with X-ray Diffraction.So the amorphous silicon thin films could be deposited rapidly by DC reactive magnetron sputtering technology.
Publication Year: 2010
Publication Date: 2010-01-01
Language: en
Type: article
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Cited By Count: 1
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