Title: Deposition of A1N thin films by magnetron reactive sputtering
Abstract: A1N films were deposited onto silicon substrates in d.c. planar magnetron system by means of reactive sputtering of aluminium in an atmosphere of nitrogen. The influence of the deposition conditions and of post-deposition annealing on the properties of the insulator and the A1NSi interface were investigated.
Publication Year: 1981
Publication Date: 1981-07-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 45
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