Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching

Name: Work Video:
Duration: 3 min 30 s
Seiji Samukawa
{'id': 'https://openalex.org/W2044493643', 'doi': 'https://doi.org/10.1143/jjap.45.2395', 'title': 'Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching', 'display_name': 'Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching', 'publication_year': 2006, 'publication_date': '2006-04-01', 'ids': {'openalex': 'https://openalex.org/W2044493643', 'doi': 'https://doi.org/10.1143/jjap.45.2395', 'mag': '2044493643'}, 'language': 'en', 'primary_location': {'is_oa': True, 'landing_page_url': 'https://doi.org/10.1143/jjap.45.2395', 'pdf_url': 'https://iopscience.iop.org/article/10.1143/JJAP.45.2395/pdf', 'source': {'id': 'https://openalex.org/S143744711', 'display_name': 'Japanese Journal of Applied Physics', 'issn_l': '0021-4922', 'issn': ['0021-4922', '1347-4065'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310311669', 'host_organization_name': 'Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310311669'], 'host_organization_lineage_names': ['Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': True, 'oa_status': 'bronze', 'oa_url': 'https://iopscience.iop.org/article/10.1143/JJAP.45.2395/pdf', 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5084880356', 'display_name': 'Seiji Samukawa', 'orcid': 'https://orcid.org/0000-0003-4971-3290'}, 'institutions': [], 'countries': [], 'is_corresponding': True, 'raw_author_name': 'Seiji Samukawa', 'raw_affiliation_strings': ['Innovative Energy Research Center'], 'affiliations': [{'raw_affiliation_string': 'Innovative Energy Research Center', 'institution_ids': []}]}], 'institution_assertions': [], 'countries_distinct_count': 0, 'institutions_distinct_count': 0, 'corresponding_author_ids': ['https://openalex.org/A5084880356'], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 4.73, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 138, 'citation_normalized_percentile': {'value': 0.999961, 'is_in_top_1_percent': True, 'is_in_top_10_percent': True}, 'cited_by_percentile_year': {'min': 97, 'max': 98}, 'biblio': {'volume': '45', 'issue': '4R', 'first_page': '2395', 'last_page': '2395'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11272', 'display_name': 'Nanowire Synthesis and Applications', 'score': 0.9993, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11272', 'display_name': 'Nanowire Synthesis and Applications', 'score': 0.9993, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9982, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11301', 'display_name': 'Advanced Surface Polishing Techniques', 'score': 0.9956, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.7015943}, {'id': 'https://openalex.org/keywords/isotropic-etching', 'display_name': 'Isotropic etching', 'score': 0.42350787}], 'concepts': [{'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.89411134}, {'id': 'https://openalex.org/C45206210', 'wikidata': 'https://www.wikidata.org/wiki/Q2415817', 'display_name': 'Nanoscopic scale', 'level': 2, 'score': 0.7284032}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.7015943}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.68702024}, {'id': 'https://openalex.org/C136525101', 'wikidata': 'https://www.wikidata.org/wiki/Q5428139', 'display_name': 'Fabrication', 'level': 3, 'score': 0.63067806}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.6184645}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.5357586}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.4801485}, {'id': 'https://openalex.org/C33220542', 'wikidata': 'https://www.wikidata.org/wiki/Q6086567', 'display_name': 'Isotropic etching', 'level': 4, 'score': 0.42350787}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.4214281}, {'id': 'https://openalex.org/C82706917', 'wikidata': 'https://www.wikidata.org/wiki/Q10251', 'display_name': 'Plasma', 'level': 2, 'score': 0.41132492}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.06583482}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.047775507}, {'id': 'https://openalex.org/C71924100', 'wikidata': 'https://www.wikidata.org/wiki/Q11190', 'display_name': 'Medicine', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C204787440', 'wikidata': 'https://www.wikidata.org/wiki/Q188504', 'display_name': 'Alternative medicine', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C142724271', 'wikidata': 'https://www.wikidata.org/wiki/Q7208', 'display_name': 'Pathology', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C62520636', 'wikidata': 'https://www.wikidata.org/wiki/Q944', 'display_name': 'Quantum mechanics', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': True, 'landing_page_url': 'https://doi.org/10.1143/jjap.45.2395', 'pdf_url': 'https://iopscience.iop.org/article/10.1143/JJAP.45.2395/pdf', 'source': {'id': 'https://openalex.org/S143744711', 'display_name': 'Japanese Journal of Applied Physics', 'issn_l': '0021-4922', 'issn': ['0021-4922', '1347-4065'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310311669', 'host_organization_name': 'Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310311669'], 'host_organization_lineage_names': ['Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}], 'best_oa_location': {'is_oa': True, 'landing_page_url': 'https://doi.org/10.1143/jjap.45.2395', 'pdf_url': 'https://iopscience.iop.org/article/10.1143/JJAP.45.2395/pdf', 'source': {'id': 'https://openalex.org/S143744711', 'display_name': 'Japanese Journal of Applied Physics', 'issn_l': '0021-4922', 'issn': ['0021-4922', '1347-4065'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310311669', 'host_organization_name': 'Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310311669'], 'host_organization_lineage_names': ['Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 45, 'referenced_works': ['https://openalex.org/W1928960919', 'https://openalex.org/W1965838611', 'https://openalex.org/W1977046564', 'https://openalex.org/W1977504415', 'https://openalex.org/W1982443686', 'https://openalex.org/W1986253113', 'https://openalex.org/W1986501756', 'https://openalex.org/W1987569653', 'https://openalex.org/W1994350858', 'https://openalex.org/W1995884031', 'https://openalex.org/W1996396987', 'https://openalex.org/W1997713234', 'https://openalex.org/W1998003648', 'https://openalex.org/W1998721071', 'https://openalex.org/W1999869771', 'https://openalex.org/W2000032431', 'https://openalex.org/W2005042798', 'https://openalex.org/W2011428253', 'https://openalex.org/W2011977039', 'https://openalex.org/W2012159077', 'https://openalex.org/W2012652160', 'https://openalex.org/W2018308055', 'https://openalex.org/W2021531827', 'https://openalex.org/W2031688765', 'https://openalex.org/W2038345054', 'https://openalex.org/W2041367560', 'https://openalex.org/W2047415141', 'https://openalex.org/W2051571664', 'https://openalex.org/W2052411671', 'https://openalex.org/W2052715168', 'https://openalex.org/W2054882020', 'https://openalex.org/W2062174964', 'https://openalex.org/W2062278136', 'https://openalex.org/W2062758732', 'https://openalex.org/W2063002615', 'https://openalex.org/W2067363352', 'https://openalex.org/W2067478140', 'https://openalex.org/W2071484764', 'https://openalex.org/W2073806571', 'https://openalex.org/W2082551554', 'https://openalex.org/W2082683525', 'https://openalex.org/W2083442294', 'https://openalex.org/W2092964797', 'https://openalex.org/W2134295556', 'https://openalex.org/W4252568416'], 'related_works': ['https://openalex.org/W4388376001', 'https://openalex.org/W4386033027', 'https://openalex.org/W2090485119', 'https://openalex.org/W2059693641', 'https://openalex.org/W2035159056', 'https://openalex.org/W2028860343', 'https://openalex.org/W2009420109', 'https://openalex.org/W2003829426', 'https://openalex.org/W1976268392', 'https://openalex.org/W1492344729'], 'abstract_inverted_index': {'For': [0], 'the': [1, 11, 15, 27, 39, 65, 74, 107], 'past': [2], '30': [3], 'years,': [4], 'plasma': [5, 28], 'etching': [6, 40, 56, 67, 91], 'technology': [7, 110], 'has': [8, 57], 'led': [9], 'in': [10, 26, 53], 'efforts': [12], 'to': [13], 'shrink': [14], 'pattern': [16], 'size': [17], 'of': [18, 76, 95], 'ultralarge-scale': [19], 'integrated': [20], '(ULSI)': [21], 'devices.': [22, 44, 84], 'However,': [23], 'inherent': [24], 'problems': [25, 48], 'processes,': [29], 'such': [30], 'as': [31], 'charge': [32], 'buildup': [33], 'and': [34, 49, 72, 78, 92, 97], 'UV': [35], 'photon': [36], 'radiation,': [37], 'limit': [38], 'performance': [41], 'for': [42, 81, 106, 111], 'nanoscale': [43, 83], 'To': [45], 'overcome': [46], 'these': [47], 'fabricate': [50], 'sub-10-nm': [51], 'devices': [52], 'practice,': [54], 'neutral-beam': [55, 70], 'been': [58], 'proposed.': [59], 'In': [60], 'this': [61], 'paper,': [62], 'I': [63], 'introduce': [64], 'ultimate': [66], 'processes': [68], 'using': [69], 'sources': [71], 'discuss': [73], 'fusion': [75], 'top-down': [77], 'bottom-up': [79], 'processing': [80], 'future': [82, 112], 'Neutral': [85], 'beams': [86], 'can': [87], 'perform': [88], 'atomically': [89], 'damage-free': [90], 'surface': [93], 'modification': [94], 'inorganic': [96], 'organic': [98], 'materials.': [99], 'This': [100], 'technique': [101], 'is': [102], 'a': [103], 'promising': [104], 'candidate': [105], 'practical': [108], 'fabrication': [109], 'nano-devices.': [113]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2044493643', 'counts_by_year': [{'year': 2024, 'cited_by_count': 6}, {'year': 2023, 'cited_by_count': 2}, {'year': 2022, 'cited_by_count': 4}, {'year': 2021, 'cited_by_count': 5}, {'year': 2020, 'cited_by_count': 8}, {'year': 2019, 'cited_by_count': 7}, {'year': 2018, 'cited_by_count': 6}, {'year': 2017, 'cited_by_count': 19}, {'year': 2016, 'cited_by_count': 20}, {'year': 2015, 'cited_by_count': 10}, {'year': 2014, 'cited_by_count': 11}, {'year': 2013, 'cited_by_count': 7}, {'year': 2012, 'cited_by_count': 6}], 'updated_date': '2024-12-14T06:35:30.925015', 'created_date': '2016-06-24'}
Publication Information

Basic Information

Access and Citation

AI Researcher Chatbot

Primary Location

Authors

Topics

Keywords

Related Works
