Dielectric hard mask etching with ArF photo resist

Name: Work Video:
Duration: 3 min 30 s
Description: The ArF photo resists are rapidly progressing just in time for the 0.1 /spl mu/m device generation and beyond. There is a complex interaction between the lithographic performance and plasma etching process. This study develop a plasma etching process to etch dielectric hard mask with a commercial ArF resist and address the issue of limited etching resistance of the ArF resist.
Leonard Hsu
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