Title: A new method for high aspect X-ray mask fabrication
Abstract: High aspect X-ray mask has been fabricated using electron beam lithography and x-ray lithography. Results show that 0.1 /spl mu/m patterns with aspect up to 12 were successfully obtained. Processes were described.
Publication Year: 2002
Publication Date: 2002-11-19
Language: en
Type: article
Indexed In: ['crossref']
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