Publication Information

{'id': 'https://openalex.org/W2366595075', 'doi': None, 'title': 'The study of LIGA technology', 'display_name': 'The study of LIGA technology', 'publication_year': 2000, 'publication_date': '2000-01-01', 'ids': {'openalex': 'https://openalex.org/W2366595075', 'mag': '2366595075'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'http://en.cnki.com.cn/Article_en/CJFDTOTAL-GXJM200001009.htm', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S2764738569', 'display_name': 'Optics and Precision Engineering', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_indexed_in_scopus': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310311940', 'host_organization_name': 'Chinese Academy of Sciences', 'host_organization_lineage': ['https://openalex.org/P4310311940'], 'host_organization_lineage_names': ['Chinese Academy of Sciences'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': [], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5101562149', 'display_name': 'Jing Liang', 'orcid': 'https://orcid.org/0000-0002-1658-7761'}, 'institutions': [], 'countries': [], 'is_corresponding': True, 'raw_author_name': 'Liang Jing', 'raw_affiliation_strings': ['qiu, YAO Jin  song'], 'affiliations': [{'raw_affiliation_string': 'qiu, YAO Jin  song', 'institution_ids': []}]}], 'institution_assertions': [], 'countries_distinct_count': 0, 'institutions_distinct_count': 0, 'corresponding_author_ids': ['https://openalex.org/A5101562149'], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.0, 'has_fulltext': False, 'cited_by_count': 1, 'citation_normalized_percentile': {'value': 0.409257, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 58, 'max': 65}, 'biblio': {'volume': None, 'issue': None, 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T14158', 'display_name': 'Optical Systems and Laser Technology', 'score': 0.9734, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T14158', 'display_name': 'Optical Systems and Laser Technology', 'score': 0.9734, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T13965', 'display_name': 'Laser and Thermal Forming Techniques', 'score': 0.9681, 'subfield': {'id': 'https://openalex.org/subfields/2206', 'display_name': 'Computational Mechanics'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11583', 'display_name': 'Advanced Measurement and Metrology Techniques', 'score': 0.9417, 'subfield': {'id': 'https://openalex.org/subfields/2210', 'display_name': 'Mechanical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/liga', 'display_name': 'LIGA', 'score': 0.9849158}, {'id': 'https://openalex.org/keywords/next-generation-lithography', 'display_name': 'Next-generation lithography', 'score': 0.6468067}], 'concepts': [{'id': 'https://openalex.org/C145695476', 'wikidata': 'https://www.wikidata.org/wiki/Q1638483', 'display_name': 'LIGA', 'level': 4, 'score': 0.9849158}, {'id': 'https://openalex.org/C41794268', 'wikidata': 'https://www.wikidata.org/wiki/Q1408939', 'display_name': 'X-ray lithography', 'level': 4, 'score': 0.8325268}, {'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.82979417}, {'id': 'https://openalex.org/C163581340', 'wikidata': 'https://www.wikidata.org/wiki/Q1983848', 'display_name': 'Next-generation lithography', 'level': 5, 'score': 0.6468067}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.6367913}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.57709694}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.5474898}, {'id': 'https://openalex.org/C2777289219', 'wikidata': 'https://www.wikidata.org/wiki/Q7632154', 'display_name': 'Substrate (aquarium)', 'level': 2, 'score': 0.47421765}, {'id': 'https://openalex.org/C105487726', 'wikidata': 'https://www.wikidata.org/wiki/Q622938', 'display_name': 'Photolithography', 'level': 2, 'score': 0.44267085}, {'id': 'https://openalex.org/C153385146', 'wikidata': 'https://www.wikidata.org/wiki/Q18335', 'display_name': 'Radiation', 'level': 2, 'score': 0.43083078}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.38038442}, {'id': 'https://openalex.org/C200274948', 'wikidata': 'https://www.wikidata.org/wiki/Q256845', 'display_name': 'Electron-beam lithography', 'level': 4, 'score': 0.2981692}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.19599277}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.17073795}, {'id': 'https://openalex.org/C136525101', 'wikidata': 'https://www.wikidata.org/wiki/Q5428139', 'display_name': 'Fabrication', 'level': 3, 'score': 0.086933196}, {'id': 'https://openalex.org/C71924100', 'wikidata': 'https://www.wikidata.org/wiki/Q11190', 'display_name': 'Medicine', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C111368507', 'wikidata': 'https://www.wikidata.org/wiki/Q43518', 'display_name': 'Oceanography', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C204787440', 'wikidata': 'https://www.wikidata.org/wiki/Q188504', 'display_name': 'Alternative medicine', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C142724271', 'wikidata': 'https://www.wikidata.org/wiki/Q7208', 'display_name': 'Pathology', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C127313418', 'wikidata': 'https://www.wikidata.org/wiki/Q1069', 'display_name': 'Geology', 'level': 0, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'http://en.cnki.com.cn/Article_en/CJFDTOTAL-GXJM200001009.htm', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S2764738569', 'display_name': 'Optics and Precision Engineering', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_indexed_in_scopus': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310311940', 'host_organization_name': 'Chinese Academy of Sciences', 'host_organization_lineage': ['https://openalex.org/P4310311940'], 'host_organization_lineage_names': ['Chinese Academy of Sciences'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W2929232240', 'https://openalex.org/W2926604094', 'https://openalex.org/W2925002960', 'https://openalex.org/W2862586436', 'https://openalex.org/W2862560682', 'https://openalex.org/W2849526477', 'https://openalex.org/W2848552300', 'https://openalex.org/W2837151256', 'https://openalex.org/W2795548563', 'https://openalex.org/W2588741729', 'https://openalex.org/W2567130545', 'https://openalex.org/W2380922287', 'https://openalex.org/W2363991779', 'https://openalex.org/W2353588749', 'https://openalex.org/W2352549797', 'https://openalex.org/W2347814675', 'https://openalex.org/W2110856447', 'https://openalex.org/W2037063969', 'https://openalex.org/W1517484418', 'https://openalex.org/W1511010699'], 'abstract_inverted_index': {'The': [0, 9, 24, 45, 67, 87, 98], 'composition': [1], 'and': [2, 20, 33, 79, 94, 103], 'feature': [3], 'of': [4, 11, 55, 63, 71, 77, 83, 90, 101], 'LIGA': [5, 12], 'technology': [6], 'was': [7, 39, 57, 85, 96], 'explicated.': [8], 'principles': [10], 'process': [13], 'on': [14], 'mask,': [15], 'X': [16, 25, 48, 91], 'ray': [17, 26, 49, 92], 'lithography,': [18], 'electroform': [19, 99], 'model': [21], 'were': [22, 108], 'analyzed.': [23], 'lithography': [27, 50, 93], 'mask': [28, 56, 95], 'using': [29, 34, 52], 'polyamide': [30], 'as': [31, 36], 'substrate': [32], 'Au': [35, 102], 'a': [37], 'absorber': [38], 'fabricated': [40], 'by': [41], 'one': [42], 'step': [43], 'forming.': [44], 'synchronous': [46], 'radiation': [47], 'experiment': [51], 'this': [53], 'kind': [54], 'made': [58], 'in': [59], 'Beijing': [60], 'Key': [61], 'Lab': [62], 'the': [64], 'Synchronous': [65], 'Radiation.': [66], 'PMMA': [68], 'linkage': [69], 'structure': [70], 'micro': [72], 'electromagnetic': [73], 'motor': [74], 'with': [75], 'depth': [76, 80], '500μm': [78], 'width': [81], 'radio': [82], '8.3': [84], 'made.': [86], 'SEM': [88], 'photo': [89], 'given.': [97], 'technique': [100], 'Ni': [104], 'metal': [105], 'thick': [106], 'film': [107], 'studied,': [109], 'too.': [110]}, 'abstract_inverted_index_v3': None, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2366595075', 'counts_by_year': [], 'updated_date': '2025-01-20T15:21:42.401754', 'created_date': '2016-06-24'}