Title: Progress in the growth of YBa2Cu3O7−x thin films by MOCVD and prospects for large area, low temperature deposition
Abstract: The in situ growth of Y1B2Cu3O7−x (YBCO) superconducting thin films by the metalorganic chemical vapor deposition (MOCVD) process has shown substantial progress since the discovery of high Tc oxide superconductors (HTSC). High quality epitaxial YBCO thin films are now routinely grown by MOCVD. This paper will review the latest progress in this rapidly evolving research area. Recently reported systematic studies of the influence of important growth parameters on thin film properties are also discussed.
Publication Year: 1992
Publication Date: 1992-01-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 2
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