Abstract: 1. Overview (T. Itoh). 2. Film Growth by Ion Beam and Plasma Discharge Sputtering Methods (R.H. Cornely). 3. Preparation and Characterization of II-VI Semiconductor Films by Sputtering (T. Taguchi, A. Hiraki). 4. Sputtering Yield (Y. Yamamura, N. Itoh). 5. Low-Energy Ion/Surface Interactions During Film Growth from the Vapor Phase (J.E. Greene, S.A. Barnett, J.-E. Sundgren and A. Rockett). 6. Ion Beam Mixing (B.M. Paine, B.X. Liu). 7A. Partially Ionized Molecular Beam Epitaxy (T. Itoh, H. Takai). 7B. Ionized Cluster Beam Deposition (T. Takagi, I. Yamada). 8. Direct Ion Beam Deposition (K. Miyake, T. Tokuyama). 9. Film Growth by Utilizing Ionized Carbon Beam (S. Gonda). 10. Molecular Beam Epitaxy of III-V Compound Semiconductors Using Mass Separated Low Energy Ion Beam (Y. Makita, S. Shimizu). 11. Ion Beam Synthesis of Films (I.H. Wilson, P.L.F. Hemment, K.G. Stephens). Subject Index.
Publication Year: 1985
Publication Date: 1985-01-01
Language: en
Type: book
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Cited By Count: 13
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