Title: Design for Manufacturability of Sub-100 Nanometer Standard Cells
Abstract:To solve the issues of that the feature size is approaching the theoretic limit of existing exposure system in modern IC (integrated circuit) manufacturing, a group of technologies for sub-lOOnm proce...To solve the issues of that the feature size is approaching the theoretic limit of existing exposure system in modern IC (integrated circuit) manufacturing, a group of technologies for sub-lOOnm process modeling and DFM (design for manufacturability) problem location was introduced. And several Resolution Enhancement Technologies (RET) were adopted to improve the production yield and manufacturability of ICs. Based on them, the specific consideration in nanometer-scale standard cell design including the new design rules and design styles was proposed and some typical patterns with DFM problems were discussed in detail. As examples of verification, a set of DFM-friendly 90nm standard cell are designed and tested.Read More
Publication Year: 2006
Publication Date: 2006-06-08
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 1
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