Title: Thermodynamic stability of Al2O3 films in contact with Ti and Mo thin films : research letter
Abstract: Compound formation in the solid state between thin metal films of Ti
and Mo and electron beam-evaporated AllSUBg2l/SUBgOlSUBg3l/SUBg has been investigated
using Rutherford backscattering spectroscopy (RBS) and X-ray
diffraction (XRD). The thin films were annealed for periods ranging from 30 min to 2 h between 400 o C and 900 o C. We found that Al 2 O 3
thin films reacted with Ti, but not with Mo, to form a ternary phase. Molybdenum films tended to peel from AllSUBg2l/SUBgOlSUBg3l/SUBg (showing poor adhesion)
whereas no peeling was observed for the Ti films. RBS and XRD
proved to be suitable methods for studying interfacial reactions of this nature.
Publication Year: 2006
Publication Date: 2006-05-01
Language: en
Type: article
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Cited By Count: 3
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