Get quick answers to your questions about the article from our AI researcher chatbot
{'id': 'https://openalex.org/W2113489028', 'doi': 'https://doi.org/10.1007/bf01589739', 'title': 'Influence of resists on reactive ion etching', 'display_name': 'Influence of resists on reactive ion etching', 'publication_year': 1993, 'publication_date': '1993-05-01', 'ids': {'openalex': 'https://openalex.org/W2113489028', 'doi': 'https://doi.org/10.1007/bf01589739', 'mag': '2113489028'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1007/bf01589739', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S54553633', 'display_name': 'Czechoslovak Journal of Physics', 'issn_l': '0011-4626', 'issn': ['0011-4626', '1572-9486'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310319900', 'host_organization_name': 'Springer Science+Business Media', 'host_organization_lineage': ['https://openalex.org/P4310319965', 'https://openalex.org/P4310319900'], 'host_organization_lineage_names': ['Springer Nature', 'Springer Science+Business Media'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5026110870', 'display_name': 'Z Novotný', 'orcid': 'https://orcid.org/0000-0003-3687-2970'}, 'institutions': [{'id': 'https://openalex.org/I4210108413', 'display_name': 'TESLA (Czechia)', 'ror': 'https://ror.org/020czch62', 'country_code': 'CZ', 'type': 'company', 'lineage': ['https://openalex.org/I4210108413']}], 'countries': ['CZ'], 'is_corresponding': True, 'raw_author_name': 'Zdeněk Novotný', 'raw_affiliation_strings': ['TESLA Electronic Research Institute, Praha, Czech Republic'], 'affiliations': [{'raw_affiliation_string': 'TESLA Electronic Research Institute, Praha, Czech Republic', 'institution_ids': ['https://openalex.org/I4210108413']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': ['https://openalex.org/A5026110870'], 'corresponding_institution_ids': ['https://openalex.org/I4210108413'], 'apc_list': None, 'apc_paid': None, 'fwci': 0.0, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 0, 'citation_normalized_percentile': {'value': 0.0, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 0, 'max': 53}, 'biblio': {'volume': '43', 'issue': '5', 'first_page': '541', 'last_page': '549'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T10781', 'display_name': 'Plasma Diagnostics and Applications', 'score': 0.9983, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T10781', 'display_name': 'Plasma Diagnostics and Applications', 'score': 0.9983, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10377', 'display_name': 'Metal and Thin Film Mechanics', 'score': 0.9952, 'subfield': {'id': 'https://openalex.org/subfields/2211', 'display_name': 'Mechanics of Materials'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11661', 'display_name': 'Copper Interconnects and Reliability', 'score': 0.9946, 'subfield': {'id': 'https://openalex.org/subfields/2504', 'display_name': 'Electronic, Optical and Magnetic Materials'}, 'field': {'id': 'https://openalex.org/fields/25', 'display_name': 'Materials Science'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/photoresist', 'display_name': 'Photoresist', 'score': 0.959281}, {'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.6192399}, {'id': 'https://openalex.org/keywords/dry-etching', 'display_name': 'Dry etching', 'score': 0.57792807}, {'id': 'https://openalex.org/keywords/etch-pit-density', 'display_name': 'Etch pit density', 'score': 0.45325145}, {'id': 'https://openalex.org/keywords/isotropic-etching', 'display_name': 'Isotropic etching', 'score': 0.4160949}], 'concepts': [{'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.9648901}, {'id': 'https://openalex.org/C134406635', 'wikidata': 'https://www.wikidata.org/wiki/Q1439684', 'display_name': 'Photoresist', 'level': 3, 'score': 0.959281}, {'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.7737966}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.76014835}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.72732306}, {'id': 'https://openalex.org/C2777402240', 'wikidata': 'https://www.wikidata.org/wiki/Q6783436', 'display_name': 'Masking (illustration)', 'level': 2, 'score': 0.70632184}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.6556136}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.6192399}, {'id': 'https://openalex.org/C1291036', 'wikidata': 'https://www.wikidata.org/wiki/Q1191918', 'display_name': 'Dry etching', 'level': 4, 'score': 0.57792807}, {'id': 'https://openalex.org/C2781448156', 'wikidata': 'https://www.wikidata.org/wiki/Q1570182', 'display_name': 'Coating', 'level': 2, 'score': 0.48764265}, {'id': 'https://openalex.org/C81626474', 'wikidata': 'https://www.wikidata.org/wiki/Q2518122', 'display_name': 'Etch pit density', 'level': 4, 'score': 0.45325145}, {'id': 'https://openalex.org/C521977710', 'wikidata': 'https://www.wikidata.org/wiki/Q81163', 'display_name': 'Polymer', 'level': 2, 'score': 0.4305352}, {'id': 'https://openalex.org/C82706917', 'wikidata': 'https://www.wikidata.org/wiki/Q10251', 'display_name': 'Plasma', 'level': 2, 'score': 0.43032596}, {'id': 'https://openalex.org/C33220542', 'wikidata': 'https://www.wikidata.org/wiki/Q6086567', 'display_name': 'Isotropic etching', 'level': 4, 'score': 0.4160949}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.35903248}, {'id': 'https://openalex.org/C159985019', 'wikidata': 'https://www.wikidata.org/wiki/Q181790', 'display_name': 'Composite material', 'level': 1, 'score': 0.31573826}, {'id': 'https://openalex.org/C142362112', 'wikidata': 'https://www.wikidata.org/wiki/Q735', 'display_name': 'Art', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C62520636', 'wikidata': 'https://www.wikidata.org/wiki/Q944', 'display_name': 'Quantum mechanics', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C153349607', 'wikidata': 'https://www.wikidata.org/wiki/Q36649', 'display_name': 'Visual arts', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1007/bf01589739', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S54553633', 'display_name': 'Czechoslovak Journal of Physics', 'issn_l': '0011-4626', 'issn': ['0011-4626', '1572-9486'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310319900', 'host_organization_name': 'Springer Science+Business Media', 'host_organization_lineage': ['https://openalex.org/P4310319965', 'https://openalex.org/P4310319900'], 'host_organization_lineage_names': ['Springer Nature', 'Springer Science+Business Media'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 18, 'referenced_works': ['https://openalex.org/W1519747310', 'https://openalex.org/W1581901816', 'https://openalex.org/W1972987375', 'https://openalex.org/W1975805769', 'https://openalex.org/W2037336347', 'https://openalex.org/W2039810328', 'https://openalex.org/W2050944613', 'https://openalex.org/W2058712705', 'https://openalex.org/W2064516642', 'https://openalex.org/W2064567165', 'https://openalex.org/W2069178649', 'https://openalex.org/W2070231133', 'https://openalex.org/W2120993127', 'https://openalex.org/W2126735996', 'https://openalex.org/W2216229252', 'https://openalex.org/W4206392732', 'https://openalex.org/W4230287475', 'https://openalex.org/W4235326677'], 'related_works': ['https://openalex.org/W4321353335', 'https://openalex.org/W3176589696', 'https://openalex.org/W2751722818', 'https://openalex.org/W2519937514', 'https://openalex.org/W2329163998', 'https://openalex.org/W2113489028', 'https://openalex.org/W2033683282', 'https://openalex.org/W2009420109', 'https://openalex.org/W1989433724', 'https://openalex.org/W1970160722'], 'abstract_inverted_index': None, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2113489028', 'counts_by_year': [], 'updated_date': '2024-12-11T09:31:28.491659', 'created_date': '2016-06-24'}