Publication Information

{'id': 'https://openalex.org/W2092250055', 'doi': 'https://doi.org/10.1116/1.1319706', 'title': 'Novel alignment system for imprint lithography', 'display_name': 'Novel alignment system for imprint lithography', 'publication_year': 2000, 'publication_date': '2000-11-01', 'ids': {'openalex': 'https://openalex.org/W2092250055', 'doi': 'https://doi.org/10.1116/1.1319706', 'mag': '2092250055'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1116/1.1319706', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S4210169477', 'display_name': 'Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena', 'issn_l': '1071-1023', 'issn': ['1071-1023', '1520-8567'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320257', 'host_organization_name': 'American Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310320257'], 'host_organization_lineage_names': ['American Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5111682270', 'display_name': 'D. L. White', 'orcid': None}, 'institutions': [], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'D. L. White', 'raw_affiliation_strings': ['Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey\u200907974'], 'affiliations': [{'raw_affiliation_string': 'Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey\u200907974', 'institution_ids': []}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5110907304', 'display_name': 'O. R. Wood', 'orcid': None}, 'institutions': [], 'countries': ['US'], 'is_corresponding': False, 'raw_author_name': 'O. R. Wood', 'raw_affiliation_strings': ['Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey\u200907974'], 'affiliations': [{'raw_affiliation_string': 'Bell Laboratories, Lucent Technologies, 600 Mountain Avenue, Murray Hill, New Jersey\u200907974', 'institution_ids': []}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 0, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 3.71, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 52, 'citation_normalized_percentile': {'value': 0.841677, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 92, 'max': 93}, 'biblio': {'volume': '18', 'issue': '6', 'first_page': '3552', 'last_page': '3556'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T12224', 'display_name': 'Nanofabrication and Lithography Techniques', 'score': 1.0, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T12224', 'display_name': 'Nanofabrication and Lithography Techniques', 'score': 1.0, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10923', 'display_name': 'Force Microscopy Techniques and Applications', 'score': 0.9993, 'subfield': {'id': 'https://openalex.org/subfields/3107', 'display_name': 'Atomic and Molecular Physics, and Optics'}, 'field': {'id': 'https://openalex.org/fields/31', 'display_name': 'Physics and Astronomy'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9989, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/photomask', 'display_name': 'Photomask', 'score': 0.7680397}, {'id': 'https://openalex.org/keywords/computational-lithography', 'display_name': 'Computational lithography', 'score': 0.44300827}, {'id': 'https://openalex.org/keywords/blank', 'display_name': 'Blank', 'score': 0.44194394}], 'concepts': [{'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.8007923}, {'id': 'https://openalex.org/C14737013', 'wikidata': 'https://www.wikidata.org/wiki/Q1319657', 'display_name': 'Photomask', 'level': 4, 'score': 0.7680397}, {'id': 'https://openalex.org/C160671074', 'wikidata': 'https://www.wikidata.org/wiki/Q267131', 'display_name': 'Wafer', 'level': 2, 'score': 0.66479814}, {'id': 'https://openalex.org/C57493831', 'wikidata': 'https://www.wikidata.org/wiki/Q3134666', 'display_name': 'Projection (relational algebra)', 'level': 2, 'score': 0.5259883}, {'id': 'https://openalex.org/C172707124', 'wikidata': 'https://www.wikidata.org/wiki/Q423488', 'display_name': 'Actuator', 'level': 2, 'score': 0.5183438}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.46705592}, {'id': 'https://openalex.org/C182873914', 'wikidata': 'https://www.wikidata.org/wiki/Q5157329', 'display_name': 'Computational lithography', 'level': 5, 'score': 0.44300827}, {'id': 'https://openalex.org/C2778089247', 'wikidata': 'https://www.wikidata.org/wiki/Q368951', 'display_name': 'Blank', 'level': 2, 'score': 0.44194394}, {'id': 'https://openalex.org/C165005293', 'wikidata': 'https://www.wikidata.org/wiki/Q1074500', 'display_name': 'Chip', 'level': 2, 'score': 0.42677274}, {'id': 'https://openalex.org/C41794268', 'wikidata': 'https://www.wikidata.org/wiki/Q1408939', 'display_name': 'X-ray lithography', 'level': 4, 'score': 0.39323437}, {'id': 'https://openalex.org/C41008148', 'wikidata': 'https://www.wikidata.org/wiki/Q21198', 'display_name': 'Computer science', 'level': 0, 'score': 0.34711623}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.30097008}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.27575266}, {'id': 'https://openalex.org/C127413603', 'wikidata': 'https://www.wikidata.org/wiki/Q11023', 'display_name': 'Engineering', 'level': 0, 'score': 0.2523511}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.24583215}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.22590187}, {'id': 'https://openalex.org/C78519656', 'wikidata': 'https://www.wikidata.org/wiki/Q101333', 'display_name': 'Mechanical engineering', 'level': 1, 'score': 0.1863569}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.16430932}, {'id': 'https://openalex.org/C154945302', 'wikidata': 'https://www.wikidata.org/wiki/Q11660', 'display_name': 'Artificial intelligence', 'level': 1, 'score': 0.14911708}, {'id': 'https://openalex.org/C76155785', 'wikidata': 'https://www.wikidata.org/wiki/Q418', 'display_name': 'Telecommunications', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C11413529', 'wikidata': 'https://www.wikidata.org/wiki/Q8366', 'display_name': 'Algorithm', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1116/1.1319706', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S4210169477', 'display_name': 'Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena', 'issn_l': '1071-1023', 'issn': ['1071-1023', '1520-8567'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320257', 'host_organization_name': 'American Institute of Physics', 'host_organization_lineage': ['https://openalex.org/P4310320257'], 'host_organization_lineage_names': ['American Institute of Physics'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 9, 'referenced_works': ['https://openalex.org/W1965048209', 'https://openalex.org/W2005485153', 'https://openalex.org/W2022558743', 'https://openalex.org/W2062701478', 'https://openalex.org/W2068888675', 'https://openalex.org/W2072295402', 'https://openalex.org/W2115669216', 'https://openalex.org/W2164883365', 'https://openalex.org/W2470449730'], 'related_works': ['https://openalex.org/W2379570117', 'https://openalex.org/W2363991779', 'https://openalex.org/W2122563195', 'https://openalex.org/W2078890378', 'https://openalex.org/W2050411782', 'https://openalex.org/W2028711229', 'https://openalex.org/W2007880660', 'https://openalex.org/W1985769943', 'https://openalex.org/W1979127398', 'https://openalex.org/W1966972295'], 'abstract_inverted_index': {'A': [0], 'novel': [1], 'alignment': [2, 24, 32, 51, 115], 'system': [3, 17, 93], 'for': [4], 'imprint': [5, 36], 'lithography': [6, 30], 'in': [7, 27, 44, 97], 'the': [8, 23, 64, 80, 86, 109, 114, 135, 141], 'deep': [9], 'sub-hundred': [10], 'nanometer': [11], 'realm': [12], 'is': [13, 18, 67, 88, 137], 'proposed.': [14], 'The': [15], 'new': [16], 'inherently': [19], 'more': [20], 'precise': [21], 'than': [22], 'systems': [25], 'used': [26], 'conventional': [28], 'projection': [29, 45], 'because': [31], 'marks': [33, 52, 72, 116], 'on': [34, 53, 108], 'an': [35], 'mold': [37, 87, 136], '(the': [38], 'functional': [39], 'equivalent': [40], 'of': [41, 94, 113], 'a': [42, 54, 92, 99], 'photomask': [43], 'lithography)': [46], 'are': [47], 'directly': [48], 'compared': [49], 'to': [50, 133, 139], 'wafer': [55, 110], 'with': [56, 91], 'no': [57], 'intermediate': [58], 'optics': [59], 'or': [60], 'reference': [61], 'points.': [62], 'If': [63], 'measured': [65], 'misalignment': [66], 'so': [68], 'severe': [69], 'that': [70, 101, 130], 'all': [71, 112], 'cannot': [73], 'be': [74, 122], 'brought': [75], 'into': [76, 124], 'registration': [77, 125], 'simultaneously': [78], 'by': [79], 'usual': [81], 'x–y': [82], 'translations': [83], 'and': [84, 111], 'rotations,': [85], 'deliberately': [89], 'deformed': [90], 'piezoelectric': [95], 'actuators': [96, 132], 'such': [98], 'way': [100], 'its': [102], 'induced': [103], 'distortions': [104], 'precisely': [105], 'match': [106], 'those': [107], 'at': [117], 'each': [118], 'chip': [119], 'site': [120], 'can': [121], 'pulled': [123], 'simultaneously.': [126], 'Finite-element': [127], 'analysis': [128], 'indicates': [129], 'using': [131], 'distort': [134], 'superior': [138], 'distorting': [140], 'wafer.': [142]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2092250055', 'counts_by_year': [{'year': 2022, 'cited_by_count': 1}, {'year': 2019, 'cited_by_count': 1}, {'year': 2015, 'cited_by_count': 2}, {'year': 2014, 'cited_by_count': 2}, {'year': 2013, 'cited_by_count': 2}, {'year': 2012, 'cited_by_count': 6}], 'updated_date': '2025-01-09T13:13:38.406318', 'created_date': '2016-06-24'}