Publication Information

{'id': 'https://openalex.org/W2071317332', 'doi': 'https://doi.org/10.1016/0167-9317(89)90025-7', 'title': 'Fabrication of sub-half μm patterns for MOS devices by means of X-ray lithography and plasma etching', 'display_name': 'Fabrication of sub-half μm patterns for MOS devices by means of X-ray lithography and plasma etching', 'publication_year': 1989, 'publication_date': '1989-05-01', 'ids': {'openalex': 'https://openalex.org/W2071317332', 'doi': 'https://doi.org/10.1016/0167-9317(89)90025-7', 'mag': '2071317332'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1016/0167-9317(89)90025-7', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S158028765', 'display_name': 'Microelectronic Engineering', 'issn_l': '0167-9317', 'issn': ['0167-9317', '1873-5568'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320990', 'host_organization_name': 'Elsevier BV', 'host_organization_lineage': ['https://openalex.org/P4310320990'], 'host_organization_lineage_names': ['Elsevier BV'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref'], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5010670648', 'display_name': 'W. Windbracke', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I3133415080', 'display_name': 'Fraunhofer Institute for Microengineering and Microsystems', 'ror': 'https://ror.org/00bkxry42', 'country_code': 'DE', 'type': 'facility', 'lineage': ['https://openalex.org/I3133415080', 'https://openalex.org/I4923324']}], 'countries': ['DE'], 'is_corresponding': False, 'raw_author_name': 'W. Windbracke', 'raw_affiliation_strings': ['Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany'], 'affiliations': [{'raw_affiliation_string': 'Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany', 'institution_ids': ['https://openalex.org/I3133415080']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5082732756', 'display_name': 'H.‐L. Huber', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I3133415080', 'display_name': 'Fraunhofer Institute for Microengineering and Microsystems', 'ror': 'https://ror.org/00bkxry42', 'country_code': 'DE', 'type': 'facility', 'lineage': ['https://openalex.org/I3133415080', 'https://openalex.org/I4923324']}], 'countries': ['DE'], 'is_corresponding': False, 'raw_author_name': 'H.L. Huber', 'raw_affiliation_strings': ['Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany'], 'affiliations': [{'raw_affiliation_string': 'Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany', 'institution_ids': ['https://openalex.org/I3133415080']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5088699993', 'display_name': 'P. Staudt', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I3133415080', 'display_name': 'Fraunhofer Institute for Microengineering and Microsystems', 'ror': 'https://ror.org/00bkxry42', 'country_code': 'DE', 'type': 'facility', 'lineage': ['https://openalex.org/I3133415080', 'https://openalex.org/I4923324']}], 'countries': ['DE'], 'is_corresponding': False, 'raw_author_name': 'P. Staudt', 'raw_affiliation_strings': ['Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany'], 'affiliations': [{'raw_affiliation_string': 'Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany', 'institution_ids': ['https://openalex.org/I3133415080']}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5109805636', 'display_name': 'G. Zwicker', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I3133415080', 'display_name': 'Fraunhofer Institute for Microengineering and Microsystems', 'ror': 'https://ror.org/00bkxry42', 'country_code': 'DE', 'type': 'facility', 'lineage': ['https://openalex.org/I3133415080', 'https://openalex.org/I4923324']}], 'countries': ['DE'], 'is_corresponding': False, 'raw_author_name': 'G. Zwicker', 'raw_affiliation_strings': ['Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany'], 'affiliations': [{'raw_affiliation_string': 'Fraunhofer-Institut für Mikrostrukturtechnik (IMT) Dillenburger Straβe 53, D-1000 Berlin 33, Federal Republic of Germany', 'institution_ids': ['https://openalex.org/I3133415080']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': {'value': 2750, 'currency': 'USD', 'value_usd': 2750, 'provenance': 'doaj'}, 'apc_paid': None, 'fwci': 0.416, 'has_fulltext': True, 'fulltext_origin': 'ngrams', 'cited_by_count': 2, 'citation_normalized_percentile': {'value': 0.473059, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 61, 'max': 66}, 'biblio': {'volume': '9', 'issue': '1-4', 'first_page': '109', 'last_page': '112'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10472', 'display_name': 'Semiconductor materials and devices', 'score': 0.9993, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T11723', 'display_name': 'Optical Coatings and Gratings', 'score': 0.9988, 'subfield': {'id': 'https://openalex.org/subfields/2508', 'display_name': 'Surfaces, Coatings and Films'}, 'field': {'id': 'https://openalex.org/fields/25', 'display_name': 'Materials Science'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/dry-etching', 'display_name': 'Dry etching', 'score': 0.7656317}, {'id': 'https://openalex.org/keywords/plasma-etching', 'display_name': 'Plasma Etching', 'score': 0.6032386}, {'id': 'https://openalex.org/keywords/laser-linewidth', 'display_name': 'Laser linewidth', 'score': 0.46411687}, {'id': 'https://openalex.org/keywords/isotropic-etching', 'display_name': 'Isotropic etching', 'score': 0.42658052}], 'concepts': [{'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.7793679}, {'id': 'https://openalex.org/C1291036', 'wikidata': 'https://www.wikidata.org/wiki/Q1191918', 'display_name': 'Dry etching', 'level': 4, 'score': 0.7656317}, {'id': 'https://openalex.org/C100460472', 'wikidata': 'https://www.wikidata.org/wiki/Q2368605', 'display_name': 'Etching (microfabrication)', 'level': 3, 'score': 0.76073587}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.75765085}, {'id': 'https://openalex.org/C136525101', 'wikidata': 'https://www.wikidata.org/wiki/Q5428139', 'display_name': 'Fabrication', 'level': 3, 'score': 0.69945073}, {'id': 'https://openalex.org/C107187091', 'wikidata': 'https://www.wikidata.org/wiki/Q2392011', 'display_name': 'Plasma etching', 'level': 4, 'score': 0.6032386}, {'id': 'https://openalex.org/C130472188', 'wikidata': 'https://www.wikidata.org/wiki/Q1640159', 'display_name': 'Reactive-ion etching', 'level': 4, 'score': 0.5982675}, {'id': 'https://openalex.org/C41794268', 'wikidata': 'https://www.wikidata.org/wiki/Q1408939', 'display_name': 'X-ray lithography', 'level': 4, 'score': 0.5894471}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.53573036}, {'id': 'https://openalex.org/C105487726', 'wikidata': 'https://www.wikidata.org/wiki/Q622938', 'display_name': 'Photolithography', 'level': 2, 'score': 0.5335655}, {'id': 'https://openalex.org/C142181693', 'wikidata': 'https://www.wikidata.org/wiki/Q6493080', 'display_name': 'Laser linewidth', 'level': 3, 'score': 0.46411687}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.44658735}, {'id': 'https://openalex.org/C33220542', 'wikidata': 'https://www.wikidata.org/wiki/Q6086567', 'display_name': 'Isotropic etching', 'level': 4, 'score': 0.42658052}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.42468762}, {'id': 'https://openalex.org/C82706917', 'wikidata': 'https://www.wikidata.org/wiki/Q10251', 'display_name': 'Plasma', 'level': 2, 'score': 0.42283952}, {'id': 'https://openalex.org/C113196181', 'wikidata': 'https://www.wikidata.org/wiki/Q485223', 'display_name': 'Analytical Chemistry (journal)', 'level': 2, 'score': 0.3302149}, {'id': 'https://openalex.org/C185592680', 'wikidata': 'https://www.wikidata.org/wiki/Q2329', 'display_name': 'Chemistry', 'level': 0, 'score': 0.2871851}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.18002331}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.07174155}, {'id': 'https://openalex.org/C71924100', 'wikidata': 'https://www.wikidata.org/wiki/Q11190', 'display_name': 'Medicine', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C520434653', 'wikidata': 'https://www.wikidata.org/wiki/Q38867', 'display_name': 'Laser', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C204787440', 'wikidata': 'https://www.wikidata.org/wiki/Q188504', 'display_name': 'Alternative medicine', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C142724271', 'wikidata': 'https://www.wikidata.org/wiki/Q7208', 'display_name': 'Pathology', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C62520636', 'wikidata': 'https://www.wikidata.org/wiki/Q944', 'display_name': 'Quantum mechanics', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C43617362', 'wikidata': 'https://www.wikidata.org/wiki/Q170050', 'display_name': 'Chromatography', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1016/0167-9317(89)90025-7', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S158028765', 'display_name': 'Microelectronic Engineering', 'issn_l': '0167-9317', 'issn': ['0167-9317', '1873-5568'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320990', 'host_organization_name': 'Elsevier BV', 'host_organization_lineage': ['https://openalex.org/P4310320990'], 'host_organization_lineage_names': ['Elsevier BV'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 2, 'referenced_works': ['https://openalex.org/W2063836410', 'https://openalex.org/W3147657011'], 'related_works': ['https://openalex.org/W4387743859', 'https://openalex.org/W2765886561', 'https://openalex.org/W2542354647', 'https://openalex.org/W2196738352', 'https://openalex.org/W2094633807', 'https://openalex.org/W2093631838', 'https://openalex.org/W2082133582', 'https://openalex.org/W2045553774', 'https://openalex.org/W2011001474', 'https://openalex.org/W1991288435'], 'abstract_inverted_index': None, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2071317332', 'counts_by_year': [], 'updated_date': '2024-12-13T11:48:37.947607', 'created_date': '2016-06-24'}