Title: All-in-one static and dynamic nanostencil atomic force microscopy/scanning tunneling microscopy system
Abstract:The nanostencil is a tool for resistless lithography. It allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment. Th...The nanostencil is a tool for resistless lithography. It allows the direct patterning of complex nanometer-sized structures composed of a wide range of materials in an ultrahigh vacuum environment. This is combined with state-of-the-art scanning probe microscopy techniques (atomic force microscopy, scanning tunneling microscopy) and an electronic four-point probe. Moreover, all these capabilities are in situ and autoaligned in the field of view. The direct patterning is based on the shadow-mask technique and allows multimask processes in a static and dynamic manner.Read More
Publication Year: 2005
Publication Date: 2005-01-19
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 41
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