Title: Combustion chemical vapor deposition: A novel thin-film deposition technique
Abstract: A new open-atmosphere chemical vapor deposition (CVD) technique has been developed that we term combustion chemical vapor deposition (CCVD). During CCVD a flame provides the necessary environment for the deposition of a dense film whose elemental constituents are derived from solution, vapor, or gas sources. Ag, YSZ, BaTiO3, YIG, YBa2Cu3Ox, and Y2BaCuO5 have been deposited via CCVD with the combustion of a sprayed, cation-containing, organic solution as the sole heat source. CCVD could, for some applications, be less expensive and more flexible than conventional CVD.
Publication Year: 1993
Publication Date: 1993-07-12
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 129
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