Title: Carbon thin films deposited by Capillary Assisted Chemical Vapor Deposition
Abstract: We have grown amorphous carbon thin films (a‐C:H) on crystalline silicon wafers with a new Capillary Assisted Chemical Vapor Deposition (CA‐CVD) method. Films deposited by this low cost technique are similar to those grown by the other deposition techniques like Plasma and Ion Beam Deposition Samples were characterized by SEM, EELS and AES.
Publication Year: 1996
Publication Date: 1996-01-01
Language: en
Type: article
Indexed In: ['crossref']
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