Title: Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition Method
Abstract: Amorphous silicon films are prepared at lower temperature of 350℃by new catalyticchemical vapor deposition method.In the method,material gases (SiH4 and H2)are decomposed by catalytic reaction at given temperature ,so a -Si films are deposited on substrates.It is found that a -Si films with high quality can be obtain ,such as high photosensitivityof 10^6,low spin density of 2.5×10^16cm^-3.
Publication Year: 1998
Publication Date: 1998-01-01
Language: en
Type: article
Access and Citation
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot