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'referenced_works_count': 9, 'referenced_works': ['https://openalex.org/W1974964404', 'https://openalex.org/W1989640388', 'https://openalex.org/W1992799025', 'https://openalex.org/W2008923294', 'https://openalex.org/W2056058632', 'https://openalex.org/W2063860936', 'https://openalex.org/W2072323833', 'https://openalex.org/W2134321855', 'https://openalex.org/W2154522464'], 'related_works': ['https://openalex.org/W416105902', 'https://openalex.org/W3141090198', 'https://openalex.org/W2351463362', 'https://openalex.org/W2066638353', 'https://openalex.org/W2064596767', 'https://openalex.org/W2016856450', 'https://openalex.org/W2012264894', 'https://openalex.org/W1997657493', 'https://openalex.org/W1991736532', 'https://openalex.org/W1975826020'], 'abstract_inverted_index': {'ISO': [0], '14701の実用性を検証するため,規格にもとづいてX線光電子分光法(XPS:X-ray': [1], 'photoelectron': [2], 'spectroscopy)を用いてシリコン酸化膜厚の測定を行った.得られた測定結果は,TEMを用いて測定した酸化膜厚と相対差1.3%で良い一致を示した.XPS測定時の帯電によってSi': [3], '2pスペクトルに存在するSiO2ピーク位置が変化し,ISO': [4], '14701に示されたエネルギー範囲に入らないことがあるが,その場合はエネルギー範囲にこだわらず,帯電量に合わせてフィッティング誤差が最小になることを重視する必要がある.記載されたXPS測定やピークフィッティング,膜厚計算の手順は分かりやすく,正確な膜厚測定が可能であることが確認できたことから,ISO': [5], '14701は実用的に有用な規格であると結論できる.': [6]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W4312561360', 'counts_by_year': [], 'updated_date': '2024-09-14T20:29:28.575739', 'created_date': '2023-01-05'}