Abstract: Free Access References Prof. Kostya (Ken) Ostrikov, Prof. Kostya (Ken) Ostrikov The University of Sydney, School of Physics, Sydney, Australia Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, Lindfield, AustraliaSearch for more papers by this author Book Author(s):Prof. Kostya (Ken) Ostrikov, Prof. Kostya (Ken) Ostrikov The University of Sydney, School of Physics, Sydney, Australia Plasma Nanoscience Centre Australia (PNCA), CSIRO Materials Science and Engineering, Lindfield, AustraliaSearch for more papers by this author First published: 13 August 2008 https://doi.org/10.1002/9783527623327.refs AboutPDFPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShareShare a linkShare onFacebookTwitterLinked InRedditWechat References K. Ostrikov and S. Xu, Plasma-Aided Nanofabrication: From Plasma Sources to Nanoassembly ( Wiley-VCH Verlag GmbH, Weinheim Germany, 2007). R. P. Feynman, There is Plenty of Room at the Bottom, Paper presented at the American Physical Society Annual Meeting, 29 December 1959. Reprinted in: Miniaturization, edited by H. D. Gilbert ( Rein-hold, New York, 1961). See also http://www.zyvex.com/nanotech/feynman.html S. Iijima, Nature (London) 354, 56 (1991). K. Ostrikov, Rev. Mod. Phys. 77, 489 (2005). K. Ostrikov and A. B. Murphy, J. Phys. D: Appl. Phys. 40, 2223 (2007). C. P. Poole and F. J. Owens, Introduction to Nanotechnology ( John Wiley and Sons Ltd., New York, 2003), and the references therein. J. H. Fendler, Nanoparticles and Nanostructured Films: Preparation, Characterization and Applications ( Wiley-VCH Verlag GmbH, Weinheim, Germany, 1998). G. S. Oehrlein, Plasma Processing of Electronic Materials ( Springer, Berlin, 2003) Molecular Building Blocks for Nanotechnology: From Diamondoids to Nanoscale Materials and Applications., edited by G. A. Mansoori, Th. F. George, L. Assoufid, and G. Zhang. Series: Topics in Applied Physics, vol. 109 ( Springer, Berlin, 2007). Advances in Low Temperature RF Plasmas: Basis for Process Design, edited by T. Makabe ( Elsevier, Amsterdam, 2002). Ionized Physical Vapor Deposition, edited by J. A. Hopwood ( Academic Press, San Diego, 2001). Handbook of Plasma Immersion Ion Implantation and Deposition, edited by A. Anders ( John Wiley and Sons, Canada, Montreal, 2000). Dusty Plasmas: Physics, Chemistry, and Technological Impacts in Plasma Processing, edited by A. Bouchoule ( J. Wiley and Sons, Chicester, UK, 1999). S. V. Vladimirov, K. Ostrikov, and A. Samarian, Physics and Applications of Complex Plasmas ( Imperial College Press, Singapore, London, 2005). F. F. Chen and J. P. Chang, Principles of Plasma Processing: A Lecture Course ( Kluwer Academic Publishers, Amsterdam, 2002). Nanoparticles and Nanostructured Films: Preparation, Characterization and Applications, edited by J. H. Fendler ( Wiley VCH, Weinheim, 1998). Plasma Nanoscience: Basic Concepts and Applications of Deterministic Nanofabrication Kostya (Ken) Ostrikov Copyright c [circlecopyrt] 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim ISBN: 978-3-527-40740-8 Nano-Architectured and Nanostructured Materials: Fabrication, Control and Properties, edited by Y. Champion and H.-J. Fecht ( Wiley-VCH, Weinheim, 2004). G. Schmid, Nanoparticles: From Theory to Application ( John Wiley and Sons, New York, 2004). S. Reich, Carbon Nanotubes: Basic Concepts and Physical Properties ( John Wiley and Sons, New York, 2004). Encyclopedia of Nanoscience and Nanotechnology™, edited by H. S. Nalva ( American Scientific Publishers, New York, 2004). M. Meyyappan, L. Delzeit, A. Cas-sell, and D. Hash, Plasma Sources Sci. Technol. 12, 205 (2003), and the references therein. A. V. Melechko, V. I. Merkulov, T. E. McKnight, M. A. Guillorn, K. L. Klein, D. H. Lowndes, and M. L. Simpson, J. Appl. Phys. 97, 041301 (2005). K. Ostrikov, IEEE Trans. Plasma Sci. 35, 127 (2007). C. Helling, R. Klein, P. Woitke, U. Nowak, and E. Seldmayr, Astron. Astrophys. 423, 657 (2004). D. A. Williams and E. Herbst, Surf. Sci. 500, 823 (2002). Y. J. Pendleton and L. J. Allamandolla, Astrophys. J. Suppl. Ser. 138, 75 (2002). S. I. Popel and A. A. Gisko, Nonlin. Proc. Geophys. 13, 223 (2006). S. V. Vladimirov and K. Ostrikov, Phys. Repts. 393, 175 (2004). M. Keidar, Y. Raitses, A. Knapp, and A. M. Waas, Carbon 44, 1013 (2006). A. Chhowalla and G.A.J. Amaratunga, Nature (London) 407, 164 (2000). S. Sriraman, S. Agrawal, E. S. Aydil, and D. Maroudas, Nature (London) 418, 62 (2002). E. Ott, C. Grebogi, and J. A. Yorke, Phys. Rev. Lett. 64, 1196 (1990). J. Li, C. Papadopoulos, J. M. Xu, and M. Moskovits, Appl. Phys. Lett. 75, 367 (1999). E. Tam, I. Levchenko, K. Ostrikov, M. Keidar, and S. Xu, Phys. Plasmas 14, 033503 (2007). M. P. Stoykovich and P. F. Nealey, Mater. Today 9, 20 (2006). L. Xu, S. C. Vemula, M. Jain, S. K. Nam, V. M. Donnelly, D. J. Economou, and P. Ruchhoeft, Nano Lett. 5, 2563 (2005). D. M. Gruen, MRS Bulletin 6, 771 (2001). D. M. Gruen, P. C. Redfern, D. A. Horner, P. Zapol, and L. A. Curtis, J. Phys. Chem B 103, 5459 (1999). R. Doering, Societal Implications of Scaling to Nanoelectronics, in: Societal Implications of Nanoscience and Nanotechnology, Nanoscale Science, Engineering, and Technology (NSET) Subcommittee Workshop Report, Edited by M. C. Roco and W. S. Bainbridge ( National Science Foundation, Arlington, Virginia, 2001). Y. J. T. Lii, Etching, in ULSI Technology, edited by C.Y. Chang and S.M. Sze ( McGraw Hill, N.Y., 1996), p. 329– 370. H. O. U. Fynbo, et al., Nature (London) 433, 136 (2005). M. S. Povich, J. C. Raymond, G. H. Jones, M. Uzzo, Y. K. Ko, P. D. Feldman, P. L. Smith, B. G. Marsden, and T. N. Woods, Science 302, 1949 (2003). S. Kempf, R. Srama, M. Horanyi, M. Burton, S. Helfert, G. MoragosKlostermeyer, M. Roy, and E. Grun, Nature (London) 433, 289 (2005). M. S. Tillack, D. W. Blair, and S. S. Harilal, Nanotechnology 15, 390 (2004). M. C. Roco, S. Williams, and A. P. Alivisatos, Nanotechnology Research Directions: Vision for Nanotechnology Research and Development in the next Decade ( Kluwer Academic, Amsterdam, 1999). See also: US National Nanotechnology Initiative, http://www.nano.gov A. McWilliams, GB-290 Nanotechnology: A Realistic Market Evaluation (Business Comm. Co., 2004), http://www.bccresearch.com/ A. Bapat, C. Anderson, C. R. Perrey, C. B. Carter, S. A. Campbell, and U. Kortshagen, Plasma Phys. Control. Fusion 46, B97 (2004). L. Mangolini, E. Thimsen, and U. Kortshagen, Nano Lett. 5, 655 (2005). S. Xu, K. Ostrikov, J. D. Long, and S. Y. Huang, Vacuum 80, 621 (2006). K. Ostrikov, J. D. Long, P. P. Rutkevych, and S. Xu, Vacuum 80, 1126 (2006). I. Levchenko, K. Ostrikov, M. Keidar, and S. Xu, J.Appl.Phys. 98, 064304 (2005). I. Levchenko, K. Ostrikov, M. Keidar, and S. Xu, Appl. Phys. Lett. 89, 033109 (2006). I. B. Denysenko, S. Xu, P. P. Rutkevych, J. D. Long, N. A. Azarenkov, and K. Ostrikov, J. Appl. Phys. 95, 2713 (2004). K. Ostrikov, H. J. Yoon, A. E. Rider, and S. V. Vladimirov, Plasma Proc. Polym. 4, 27 (2007). K. Ostrikov, Z. Tsakadze, I. Deny-senko, P. P. Rutkevych, J. D. Long, and S. Xu, Contr. Plasma Phys. 45, 514 (2005). K. Ostrikov and S. Xu, Nanofabrication of Single-Crystalline Flat-Panel Display Microemitters: a Plasma-Building Unit Approach, SPIE Proceedings "Micro-electronics, MEMS and Nanotechnology" ( SPIE, Bellingham WA, USA, 2005), vol. 6037, 6037-32 (2005). A. Fridman and L. A. Kennedy, Plasma Physics and Engineering ( Taylor & Francis, New York, 2004). J. Perrin and Ch. Hollenstein, in Dusty Plasmas: Physics, Chemistry and Technological Impacts in Plasma Processing, edited by A. Bouchoule ( John Wiley and Sons Inc., New York, 1999), p. 77– 180. C. Hollenstein, Plasma Phys. Control. Fusion 42, R93 (2000). D. S. Bethune, C. H. Kiang, M. S. DeVries, G. Gorman, R. Savoy, and R. Beyers, Nature (London) 363, 605 (1993). J. Stangl, V. Holy, and G. Bauer, Rev. Mod. Phys. 76, 725 (2004). V. Shchukin, N. N. Ledentsov, and D. Bimberg, Epitaxy of Nanostructures ( Springer, Berlin/Heidelberg, 2003). M. S. Dresselhaus, G. Dresselhaus, and P. C. Eklund, Science of Fullerenes and Carbon Nanotubes ( Academic, San Diego, CA, 1996). N. R. Franklin and H. Dai, Adv. Mater. 12, 890 (2002). N. M. Hwang and D. Y. Kim, Int. Mater. Rev. 49, 171 (2004). N. M. Hwang and D. Y. Yoon, J. Cryst. Growth 143, 103 (1994). I. D. Jeon, et al., J. Cryst. Growth 223, 6 (2001). M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing ( John Wiley and Sons Inc., New York, 1994). H. Yasuda, Plasma Polymerization ( Academic, New York, 1985). N. M. Hwang, J. H. Hahn, and D. Y. Yoon, J. Cryst. Growth 162, 55 (1996). N. M. Hwang, J. Cryst. Growth 204, 85 (1999). I. D. Jeon, C. J. Park, D. Y. Kim, and N. M. Hwang, J. Cryst. Growth 213, 79 (2000). P. Gerhardt and K. H. Homann, Combust. Flame 81, 289 (1990). N. M. Hwang, W. S. Cheong, D. Y. Yoon, and D. Y. Kim, J. Cryst. Growth 218, 33 (2000). A. V. Rode, et al., Phys. Rev. B 70, 054407 (2004). M. Tanda, M. Kondo, and A. Matsuda, Thin Sol. Films 427, 33 (2003). M. Shiratani, K. Koga, and Y. Watanabe, Thin Sol. Films 427, 1 (2003). K. Wegner, P. Piseri, H. V. Tafreshi, and P. Milani, J. Phys. D: Appl. Phys. 39, R439 (2006). E. Magnano, et al., Phys. Rev. B 67, 125414 (2003). G. Viera, M. Mikikian, E. Bertran, P. Roca i Cabarrocas, and L. Boufendi, J. Appl. Phys. 92, 4684 (2002). Y. Poissant, P. Chatterjee, and P. Roca i Cabarrocas, J. Appl. Phys. 94, 7305 (2003). A. Fontcuberta i Morral, P. Roca i Cabarrocas, and C. Clerc, Phys. Rev. B 69, 125307 (2004). V. Suendo, A. Kharchenko, and P. Roca i Cabarrocas, Thin Sol. Films 451–452, 259 (2004). A. Bapat, C. R. Perrey, S. A. Campbell, C. B. Carter, and U. Kortshagen, J. Appl. Phys. 94, 1969 (2003). A. Bapat, M. Gatti, Y.-P. Ding, S. A. Campbell, and U. Kortshagen, J. Phys. D.: Appl. Phys. 40, 2247 (2007) P. Mulvaney, MRS Bulletin 6, 1009 (2001). B. Gilbert, F. Huang, H. Zhang, G. Waychunas, and J. F. Banfield, Science 305, 651 (2004). H. Kersten, et al., New J. Phys. 5, 93.1 (2003). M. Chhowalla, K. B. K. Teo, C. Dukati, N. L. Rupersinghe, G. A. J. Amaratunga, A. C. Ferrari, D. Roy, J. Robertson, and W. I. Milne, J. Appl. Phys. 90, 5308 (2001). C. Bower, W. Zhu, S. Jin, and O. Zhou, Appl. Phys. Lett. 77, 830 (2000). J. Frantz and K. Nordlund, Phys. Rev. B 67, 075415 (2003). P. Roca i Cabarrocas, N. Chaabane, A. V. Kharchenko, and S. Tchakarov, Plasma Phys. Control. Fusion 46, B235 (2004). Z. L. Tsakadze, K. Ostrikov, J. D. Long, and S. Xu, Diam. Relat. Mater. 13, 1923 (2004). Z. L. Tsakadze, K. Ostrikov, and S. Xu, Surf. Coat. Technol. 191/1, 49 (2005). Z. L. Tsakadze, I. Levchenko, K. Ostrikov, S. Xu, Carbon 45, 2022 (2007). M. Mozetic, U. Cvelbar, M. K. Sunkara, and S. Vaddiraju, Adv. Mater. 17, 2138 (2005). W. W. Stoffels, E. Stoffels, G. H. P. M. Swinkels, H. Videlot, M. Boufnichkel, and G.M.W. Kroesen, Phys. Rev. E 59, 2302 (1999). J. Perrin, M. Shiratani, P. Kae-Nune, H. Videlot, J. Jolly, and J. Guillion, J. Vac. Sci. Technol. 16, 278 (1998). M. Frenklash and H. Wang, Phys. Rev. B 43, 1520 (1991). E. Tam, I. Levchenko, and K. Ostrikov, J. Appl. Phys. 100, 036104 (2006). T. Baron, P. Gentile, N. Magnea, and P. Mur, Appl. Phys. Lett. 79, 1175 (2001). K. Tsubouchi and K. Masu, J. Vac. Sci. Technol. A 10, 856 (1992). H. M. Thomas and G. E. Morphill, Nature (London) 379, 806 (1996). R. Merlino and J. Goree, Phys. Today, July 2004, 32 (2004). P. Rutkevych, K. Ostrikov, S. Xu, and S. V. Vladimirov, J. Appl. Phys. 96, 4421 (2004). J. Moran, K. Ostrikov, B. W. James, and A. Samarian, Investigation Into the Deposition of Ordered Structures in an Ionized Granular Gas, Interim Report on research project "Complex Ionized Gas Systems: Pattern Transfer From Gas to Surface", School of Physics, The University of Sydney, Australia (2006). P. Hohenberg and W. Kohn. Phys. Rev. 136, B864 (1964). W. Kohn and L. J. Sham, Phys. Rev. 140, A1133 (1965). S. Lunqvist and N. H. March, The Theory of the Homogenous Electron Gas ( Plenum Press, New York, 1983). http://www.accelrys.com/ B. Delley, J. Chem. Phys. 113, 7756 (2000). Handbook of Nanophase and Nanostructured Materials. Volume II: Characterization, edited by Z.L. Wang, Y. Liu, and Z. Zhang, ( Springer, Berlin, 2002). U. V. Bhandarkar, M. T. Swihart, S. L. Girshik, and U. Kortshagen, J.Phys.D:Appl.Phys. 33, 2731 (2000). S.-M. Suh, S. L. Girshick, U. R. Kortshagen, and M. R. Zachariah, J. Vac. Sci. Technol. A 21, 251 (2003). K. De Bleecker, A. Bogaerts, R. Gijbels, and W. Goedheer, Phys. Rev. E 69, 056409 (2004). K. Ostrikov, I. B. Denysenko, S. V. Vladimirov, S. Xu, H. Sugai, and M.Y. Yu, Phys.Rev.E 67, 056408 (2004). I. B. Denysenko, K. Ostrikov, S. Xu, M. Y. Yu, and C. H. Diong, J. Appl. Phys. 94, 6097 (2003). H. Sugai, I. Ghanashev, M. Hosokawa, K. Mizuno, K. Nakamura, H. Toyoda, and K. Yamauchi, Plasma Sources Sci. Technol. 10, 378 (2001). A. A. Fridman, L. Boufendi, T. Hbid, B. N. Potapkin, and A. Bouchoule, J. Appl. Phys. 79, 1303 (1996). P. Roca i Cabarrocas, S. Hamma, S. N. Sharma, G. Viera, E. Bertran, and J. Costa, J. Non-Cryst. Sol. 227–230, 871 (1998). N. Chaabane, A. V. Kharchenko, H. Vach, and P. Roca i Cabarrocas, New J. Phys. 3, 37.1 (2003). N. Chaabane, P. Roca i Cabarrocas, and H. Vach, J. Non-Cryst. Solids 338– 340, 51 (2004). M. Shiratani, S. Maeda, K. Koga, and Y. Watanabe, Jpn. J. Appl. Phys., Part 1 39, 287 (2000). A. Fontcuberta i Morral and P. Roca i Cabarrocas, Thin Sol. Films 383, 161 (2001). J. Costa, in Handbook of Nanostructured Materials, edited by H. S. Nalva ( Academic, New York, 2000), vol. 1, p. 57. P. Cernetti, R. Gresback, S. A. Campbell, and U. Kortshagen, Chem. Vap. Deposition 13, 345 (2007). M. L. Ostraat, et al., Appl.Phys. Lett. 79, 433 (2001). G. Conibeer, M. Green, R. Corkish, Y. Cho, E. C. Cho, C. W. Jiang, T. Fang-suwannarak, E. Pink, Y. Huang, T. Puzzer, T. Trupke, B. Richards, A. Shalav, and L. Lin, Thin Sol. Films 511–512, 645 (2006). Q. J. Cheng, S. Xu, J. D. Long, and K. Ostrikov, Appl. Phys. Lett. 90, 173112 (2007). K. Ostrikov, I. Denysenko, M. Y. Yu, and S. Xu, Phys. Scripta 72, 277 (2005). T. Kuykendall, P. J. Pauzauskie, Y. Zhang, J. Goldberger, D. Sirbuly, J. Denlinger, and P. Yang, Nature Mater. 3, 524 (2004). O. A. Louchev and J. R. Hester, J. Appl. Phys. 94, 2002 (2003). S. Hong, I. Stefanovic, J. Berndt, and J. Winter, Plasma Sources Sci. Technol. 12, 46 (2003). E. Kovacevic, I. Stefanovic, J. Berndt, and J. Winter, J. Appl. Phys. 93, 2924 (2003). G. Gebauer and J. Winter, New J. Phys. 5, 38.1 (2003). S. Stoykov, C. Eggs, and U. Kortshagen, J. Phys. D: Appl. Phys. 34, 2160 (2001). F. J. Gordillo-Vazques and J. M. Al-bella, Plasma Sources Sci. Technol. 13, 50 (2004). K. Ostrikov, H.-J. Yoon, A. E. Rider, and V. Ligatchev, Phys. Scripta 76, 187 (2007). B. J. Hrivnak and S. Kwok, Astroph. J. 513, 869 (1999). J. D. Long, S. Xu, S. Y. Huang, P. P. Rutkevych, M. Xu, and C. H. Diong, IEEE Trans. Plasma Sci. 33, 240 (2005). V. I. Merkulov, D. H. Lowndes, Y. Y. Wei, G. Eres, and E. Voelkl, Appl. Phys. Lett. 76, 3555 (2000). D. B. Hash and M. Meyyappan, J. Appl. Phys. 93, 750 (2003). S. Reich, L. Li, and J. Robertson, Chem. Phys. Lett. 421, 469 (2006). S. Hofmann, R. Sharma, C. Ducati, G. Du, C. Matttevi, C. Cepek, M. Cantoro, S. Pisana, A. Parvez, F. Cervantes-Sodi, A. C. Ferrari, R. Dunin-Borkowski, S. Lizzit, L. Petaccia, A. Goldoni, and J. Robertson, Nano Lett. 7, 602 (2007). T. Nozaki, K. Ohnishi, K. Okazaki, and U. Kortshagen, Carbon 45, 364 (2007). T. Saito, S. Ohshima, W. C. Xu, H. Ago, M. Yumura, and S. Iijima, J. Phys. Chem. B 109, 10647 (2005). M. Paillet, J. C. Meyer, T. Michel, V. Jourdain, P. Poncharal, J.-L. Sauvajol, N. Cordente, C. Amiens, B. Chaudret, S. Roth, and A. Zahab, Diam. Relat. Mater. 15, 1019 (2006). J. Y. Raty, F. Gygi, and G. Galli, Phys. Rev. Lett. 95, 096103 (2005). B. Q. Wei, J. D'Arcy-Gall, P. M. Ajayan, and G. Ramanath, Appl. Phys. Lett. 83, 3581 (2003). T. Hirata, N. Satake, G. H. Jeong, T. Kato, R. Hatakeyama, K. Motomiya, and K. Tohji, Appl. Phys. Lett. 83, 1119 (2003). D. Cai, J. M. Mataraza, Z. H. Qin, Z. Huang, J. Huang, T. C. Chiles, D. Carnahan, K. Kempa, Z. Ren, Nature Methods 2, 449 (2005). P. P. Rutkevych, K. Ostrikov, and S. Xu, Phys. Plasmas 12, 103507 (2005). P. P. Rutkevych, K. Ostrikov, and S. Xu, Phys. Plasmas 14, 043502 (2007). S. Walch and R. Merkle, Nanotechnology 9, 1998 (1998). A. T. H. Chuang, J. Robertson, B. O. Boskovic, K. K. K. Koziol, Appl. Phys. Lett. 90, 123107 (2007). M. Hiramatsu, K. Shiji, H. Amano, and M. Hori, Appl. Phys. Lett. 84, 4708 (2004). N. Marks, N. C. Cooper, D. R. McKenzie, D. G. McCulloch, P. Bath, and S. P. Russo, Phys. Rev. B 65, 075411 (2002). N. Marks, J. M. Bell, G. K. Pearce, D. R. McKenzie, and M. M. M. Bilek, Diam. Relat. Mater. 12, 2003 (2003). I. Levchenko, M. Korobov, M. Romanov, and M. Keidar, J. Phys. D: Appl. Phys. 37, 1690 (2004). V. I. Merkulov, A. V. Melechko, M. A. Guillorn, D. H. Lowndes, and M. L. Simpson, Appl. Phys. Lett. 79, 2970 (2001). J. F. AuBuchon, L-H. Chen, and S. Jin, J. Phys. Chem. B 109, 6044 (2005). J. Robertson, Mater. Today 10, 36 (2007). E. Tam, K. Ostrikov, I. Levchenko, M. Keidar, and S. Xu, Multi-Scale Hybrid Numerical Simulation of the Growth of High Aspect Ratio Nanostructures, Comput. Mater. Sci. in press, DOI:10.1016/j.commatsci.2008.01.048 (2008). H. Kanzow and A. Ding, Phys. Rev. B 60, 11180 (1999). S. Helveg, C. Lopez-Cartez, J. Sehested, P. L. Hansen, B. S. Clausen, J. R. Rostrup-Nielsen, F. AbildPedersen, and J. Norskov, Nature (London) 427, 426 (2004). J. Goree and T. E. Sheridan, J. Vac. Sci. Technol. A 10, 3540 (1992). I. Denysenko and K. Ostrikov, Appl. Phys. Lett. 90, 251501 (2007). A. N. Obraztsov, I. Pavlovsky, A. P. Volkov, E. D. Obraztsova, A. L. Chuvilin, and V. L. Kuznetsov, J. Vac. Sci. Technol. B 18, 1059 (2000). S. H. Tsai, F. K. Chiang, T. G. Tsai, F. S. Shieu, and H. C. Shih, Thin Sol. Films 366, 11 (2000). S. Hofmann, C. Dukati, J. Robertson, and B. Kleinsorge, Appl. Phys. Lett. 83, 135 (2003). K. Ostrikov, I. Levchenko, and S. Xu, Comput. Phys. Commun. 177, 110 (2007). I. Levchenko, K. Ostrikov, and E. Tam, Appl. Phys. Lett. 89, 223108 (2006). I. Levchenko and K. Ostrikov, J. Phys. D 40, 2308 (2007). A. Rider, I. Levchenko, and K. Ostrikov, J. Appl. Phys. 101, 044306 (2007). I. Levchenko, A. Rider, and K. Ostrikov, Appl. Phys. Lett. 90, 193110 (2007). A. Rider, I. Levchenko, K. Ostrikov, and M. Keidar, Plasma Proc. Polym. 4, 638 (2007). J. C. Ho, I. Levchenko, and K. Ostrikov, J. Appl. Phys. 101 094309 (2007). I. Levchenko and K. Ostrikov, Numerical Simulation of Self-Organized Nanoislands in Plasma-Based Assembly of Quantum Dot Arrays, SPIE Proceedings "Microelectronics, MEMS and Nanotechnology" ( SPIE, Bellingham WA, USA, 2005), vol. 6039, 6039-24 (2005). F. Rosei, J. Phys. Condens. Matter 16, S1373 (2004). I. H. Hutchinson, Principles of Plasma Diagnostics, Second Edition ( Cam-bridge University Press, Cambridge, UK, 2002). H. R. Griem, Principles of Plasma Spectroscopy ( Cambridge University Press, Cambridge, UK, 2005). M. Su, B. Zheng, and J. Liu, Chem. Phys. Lett. 322, 321 (2000). L. Delzeit, B. Chen, A. Cassell, R. Stevens, C. Nguyen, and M. Meyyappan, Chem. Phys. Lett. 348, 368 (2001). L. Delzeit, I. McAninch, B. A. Cruden, D. Hash, B. Chen, J. Han, and M. Meyyappan, J. Appl. Phys. 91, 6027 (2002). Y.M. Shyu and F.C.N. Hong, Diam. Relat. Mater. 10, 1241 (2001). M. Chen, C. M. Chen, S. C. Shi, and C.F. Chen, Jpn. J. Appl. Phys 42, 614 (2003). Y. S. Woo, I. T. Han, Y. J. Park, H. J. Kim, J. E. Jung, N. S. Lee, D. Y. Jeon, and J.M. Kim, Jpn. J. Appl. Phys Part 1 42, 1410 (2003). T. Hirao, K. Ito, H. Furuta, Y. K. Yap, T. Ikuno, S. Honda, Y. Mori, T. Sasaki, and K. Oura, Jpn. J. Appl. Phys. Part 1 40, L631 (2001). S. Xu, K.N. Ostrikov, Y. Li, E.L. Tsakadze, and I. R. Jones, Phys. Plasmas 8, 2549 (2001). D. Herrebout, A. Bogaerts, M. Yan, R. Gijbels, W. Goedheer, and E. Dekempeneer, J. Appl. Phys. 90, 570 (2001). S. F. Yoon, K. H. Tan, Rusli, and J. Ahn, J. Appl. Phys. 91, 40 (2002). V. Ivanov, O. Proshina, T. Rakhimova, A. Rakhimov, D. Herrebout, and A. Bogaerts, J. Appl. Phys. 91, 6296 (2002). K. Bera, B. Farouk, and Y. H. Lee, Plasma Sources Sci. Technol. 10, 211 (2001). K. Bera, B. Farouk, and P. Vitello, J. Phys. D: Appl. Phys. 34, 1479 (2001). D. Hash, D. Bose, T. R. Govindan, and M. Meyyappan, J. Appl. Phys. 93, 6284 (2003). M. Camero, F. J. Gordillo-Vazques and C. Gomez-Aleixandre, Chem. Vap. Deposition 13, 326 (2007). S. Xu, K. N. Ostrikov, W. Luo, and S. Lee, J. Vac. Sci. Technol. A, 18, 2185 (2000). K. N. Ostrikov, S. Xu, and A. B. M. Shafiul Azam, J. Vac. Sci. Technol. A 20, 251 (2002). K. N. Ostrikov, S. Xu, and M. Y. Yu, J. Appl. Phys. 88, 2268 (2000). K. Ostrikov, E. Tsakadze, N. Jiang, Z. Tsakadze, J. Long, R. Storer, and S. Xu, IEEE Trans. Plasma Sci. 30, 128 (2002). K. Ostrikov, E. Tsakadze, S. Xu, S. V. Vladimirov, and R. Storer, Phys. Plasmas 10, 1146 (2003). K. N. Ostrikov, I. B. Denysenko, E. L. Tsakadze, S. Xu, and R. G. Storer, J. Appl. Phys. 92, 4935 (2002). V. Schulz-von der Gathen, J. Roepcke, T. Gans, M. Kaning, C. Lukas, and H. F. Doebele, Plasma Sources Sci. Technol. 10, 530 (2001). C. Riccardi, R. Barni, M. Fontanesi, P. Tosi, Chem. Phys. Lett. 329, 66 (2000). T. Nozaki, K. Okazaki, U. Kortshagen, and J. Heberlein, Bull. Amer. Phys. Soc. 48, No. 6, 13 (2003). E. Gogolides, D. Mary, A. Rhallabi, and G. Turban, Jpn. J. Appl. Phys., Part 1 34, 261 (1995). J. Geddes, R. W. McCullough, A. Donnelly, and H. B. Gilbody, Plasma Sources Sci. Technol. 2, 93 (1993). H. Amemiya, J. Phys. Soc. Japan 66, 1335 (1997). J. T. Gudmundsson, Plasma Sources Sci. Technol. 10, 76 (2001). T. Chevolleau and W. Fukarek, Plasma Sources Sci. Technol. 9, 568 (2000). N. Sadeghi, M. van de Grift, D. Vender, G. M. W. Kroesen, and F. J. de Hoog, Appl. Phys. Lett. 70, 835 (1997). H. Kojima, H. Toyoda, and H. Sugai, Appl. Phys. Lett. 55, 1292 (1989). C. Hopf, K. Letourneur, W. Jacob, T. Schwarz-Selinger, and A. Von Keudell, Appl. Phys. Lett. 74, 3800 (1999). A. Von Keudell, T. Schwarz-Selinger, M. Meier, and W. Jacob, Appl. Phys. Lett. 76, 676 (2000). N. Mutsukura, S. Inoue, and Y. Machi, J. Appl. Phys. 72, 43 (1992). C. Hopf, T. Schwarz-Selinger, W. Jacob, and A. Von Keudell, J. Appl. Phys. 87, 2719 (2000). C. Lee and M. A. Lieberman, J.Vac. Sci. Technol. A 13, 368 (1995). V. A. Godyak, Soviet Radio Frequency Discharge Research ( Delphic, Falls Church, VA, 1986). M. Kawase, T. Nakai, A. Yamaguchi, T. Hakozaki, and K. Nashimoto, Jpn. J. Appl. Phys, 36, Part 1, 3396 (1997). I. Peres, M. Fortin, and J. Margot, Phys. Plasmas, 3, 1754 (1996). M. Keidar and A. M. Waas, Nanotechnology 15, 1571 (2004). D. B. Hash, M. S. Bell, K. B. K. Teo, B. A. Cruden, W. I. Milne, and M. Meyyappan, Nanotechnology 16, 925 2005 M. J. Kushner, J. Appl. Phys. 95, 846 (2004). K. de Bleecker, A. Bogaerts, and W. Goedheer, Appl. Phys. Lett. 88, 151501 (2006). W. B. Choi, D. S. Chung, J. H. Kang, H. Y. Kim, Y. W. Jin, I. T. Han, Y. H. Lee, J. E. Jung, N. S. Lee, G. S. Park, and J. M. Kim, Appl. Phys. Lett. 75, 3129 (1999). C. L. Tsai, C. W. Chao, C. L. Lee, H. C. Shih, Appl. Phys. Lett. 74, 3462 (1999). C. L. Tsai, C. F. Chen, and L. K. Wu, Appl. Phys. Lett. 81, 721 (2002). S. B. Lee, A. S. Teh, K. B. K. Teo, M. Chhowalla, D. G. Hasko, W. I. Milne, G. A. J. Amaratunga, and H. Ahmed, Nanotechnology 14, 192 (2003). S. Bhattacharyya, A. Granier, and G. Turban, J. Appl. Phys. 86, 4668 (1999). A. Von Keudell and W. Jacob, Progr. Surf. Sci. 76, 21 (2004). K. B. K. Teo, D. B. Hash, R. G. Lacerda, N. L. Rupesinghe, M. S. Bell, S. H. Dalal, D. Bose, T. R. Govindan, B. A. Cruden, M. Chhowalla, G. A. J. Amaratunga, M. Meyyappan, and W. I. Milne, Nano Lett. 4, 921 (2004). E. L. Tsakadze, K. Ostrikov, Z. L. Tsakadze, and S. Xu, J. Appl. Phys. 97, 013301 (2005). J. Perrin, C. Bohm, R. Etemadi, and A. Lloret, Plasma Sources Sci. Technol. 3, 252 (1994). A. Gallagher, Phys. Rev. E 62, 2690 (2000). A. A. Howling, L. Sansonnens, J.-L. Dorrier, and Ch. Hollenstein, J. Phys. D: Appl. Phys. 26, 1003 (1993). Ch. Hollenstein, J.-L. Dorier, J. Dutta, L. Sansonnens, and A. A. Howling, Plasma Sources Sci. Technol. 3, 278 (1994). A. Bogaerts, K. de Bleecker, V. Georgieva, I. Kolev, M. Madani, E. Neyts, Plasma Proc. Polym. 3, 110 (2006). L. Boufendi, J. Herman, A. Bouchoule, B. Dubreuil, E. Stoffels, W. W. Stoffels, and M. L. de Giorgi, J. Appl. Phys. 76, 148 (1994). P. Cernetti, R. Gresback, S. A. Campbell, and U. Kortshagen, Chem. Vap. Depos. 13, 345 (2007). U. Kogelschats, Plasma Phys. Contr. Fusion 46, B63 (2004). S. P. Fisenko, D. B. Kane, and M. S. El-Shall, J. Chem. Phys. 123, 104704 (2005). M. N. Mautner, et al., Faraday Discuss. 133, 103 (2006). S. P. Fisenko, private communication (2007). S. P. Fisenko, Appl. Surf. Sci. 106, 94 (1996). T. Seto, Y. Kawakami, N. Suzuki, M. Hirasawa, S. Kano, N. Aya, S. Sasaki, and H. Shimura, J. Nanopart. Res. 3, 185 (2001). K. De Bleecker, A. Bogaertz, and W. Goedheer, Phys. Rev. E 73, 026405 (2006). Ch. Deschenaux, Etude de l'Origine et de la Croissance de Particules Submicrometriques dans des Plasmas Radiofrequence Reactifs, Ph. D. Thesis, Centre de Recherches en Physique des Plasmas, Association E