Title: Binary Oxide Superlattices: Versatile Tunability of the Metal Insulator Transition in (TiO<sub>2</sub>)<i><sub>m</sub></i>/(VO<sub>2</sub>)<i><sub>m</sub></i> Superlattices (Adv. Funct. Mater. 51/2020)
Abstract: Advanced Functional MaterialsVolume 30, Issue 51 2070339 FrontispieceFree Access Binary Oxide Superlattices: Versatile Tunability of the Metal Insulator Transition in (TiO2)m/(VO2)m Superlattices (Adv. Funct. Mater. 51/2020) Gyula Eres, Gyula Eres Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorShinbuhm Lee, Shinbuhm Lee Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USA Department of Emerging Materials Science, Daegu-Gyeongbuk Institute of Science and Technology, Daegu, 42988 Republic of KoreaSearch for more papers by this authorJohn Nichols, John Nichols Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorChanghee Sohn, Changhee Sohn Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorJong Mok Ok, Jong Mok Ok Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorAlessandro R. Mazza, Alessandro R. Mazza Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorChenze Liu, Chenze Liu Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN, 37996 USASearch for more papers by this authorGerd Duscher, Gerd Duscher Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN, 37996 USASearch for more papers by this authorHo Nyung Lee, Ho Nyung Lee Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorDaniel E. McNally, Daniel E. McNally Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorXingye Lu, Xingye Lu Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorMilan Radovic, Milan Radovic Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorThorsten Schmitt, Thorsten Schmitt Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this author Gyula Eres, Gyula Eres Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorShinbuhm Lee, Shinbuhm Lee Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USA Department of Emerging Materials Science, Daegu-Gyeongbuk Institute of Science and Technology, Daegu, 42988 Republic of KoreaSearch for more papers by this authorJohn Nichols, John Nichols Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorChanghee Sohn, Changhee Sohn Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorJong Mok Ok, Jong Mok Ok Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorAlessandro R. Mazza, Alessandro R. Mazza Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorChenze Liu, Chenze Liu Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN, 37996 USASearch for more papers by this authorGerd Duscher, Gerd Duscher Department of Materials Science and Engineering, University of Tennessee, Knoxville, TN, 37996 USASearch for more papers by this authorHo Nyung Lee, Ho Nyung Lee Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, TN, 37831 USASearch for more papers by this authorDaniel E. McNally, Daniel E. McNally Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorXingye Lu, Xingye Lu Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorMilan Radovic, Milan Radovic Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this authorThorsten Schmitt, Thorsten Schmitt Paul Scherrer Institut, Photon Science Division, Villigen PSI, CH-5232 SwitzerlandSearch for more papers by this author First published: 15 December 2020 https://doi.org/10.1002/adfm.202070339AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinkedInRedditWechat Graphical Abstract The fabrication of binary oxide superlattices is undertaken as a general approach for exploring novel concepts and phenomena in reduced dimensionality systems of strongly correlated oxides. In article number 2004914, Gyula Eres, Milan Radovic, Thorsten Schmitt, and co-workers achieve a wide range of tunability of the metal insulator transition in VO2 while reducing oxygen vacancy formation that is detrimental to electrical properties. The design was prepared by Yun-Yi Pai and Gyula Eres both of ORNL. Volume30, Issue51December 15, 20202070339 RelatedInformation
Publication Year: 2020
Publication Date: 2020-12-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 4
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