Title: ChemInform Abstract: Electrochemical Characteristics of Amorphous Titanium Carbide Films Produced by Low‐Temperature Metal‐Organic Chemical Vapor Deposition (MOCVD).
Abstract: Abstract A comparative potentiodynamic study is carried out for amorphous TiC films prepared by either electron beam vaporization (EBV) or by MOCVD using Ti(bipy)3 or (Me 3 CCH 2 ) 4 Ti and for bulk polycrystalline TiC.
Publication Year: 1988
Publication Date: 1988-04-12
Language: en
Type: article
Indexed In: ['crossref']
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