Title: Rotary Spatial Plasma Enhanced Atomic Layer Deposition — An enabling manufacturing technology for µm-thick ALD films
Abstract: Atomic Layer Deposition (ALD) is well known for its high film quality and high conformality, but limited by the low deposition rate. Beneq proposes a novel approach using Rotary Spatial Plasma Enhanced ALD process, which can reach deposition rates 10× higher than traditional pulsed ALD. This technology also enables use of PEALD in batch mode with high throughput. This paper describes the technology in more details.
Publication Year: 2017
Publication Date: 2017-03-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 1
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