Title: Characterization of Cavitation in a Single Wafer or Photomask Cleaning Tool
Abstract: A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by the presence of cavitation, a thorough acoustic analysis was performed on the device, by using a calibrated hydrophone scanned at the photomask location, and a quartz photomask with embedded sensors.
Publication Year: 2016
Publication Date: 2016-09-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 1
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