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{'id': 'https://openalex.org/W2368732744', 'doi': None, 'title': 'Electrophoretic Coating Process of Aluminum', 'display_name': 'Electrophoretic Coating Process of Aluminum', 'publication_year': 2002, 'publication_date': '2002-01-01', 'ids': {'openalex': 'https://openalex.org/W2368732744', 'mag': '2368732744'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://en.cnki.com.cn/Article_en/CJFDTOTAL-BMJS200203013.htm', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S191474129', 'display_name': 'Surface Technology', 'issn_l': '0376-4583', 'issn': ['0376-4583', '1878-1063'], 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310320990', 'host_organization_name': 'Elsevier BV', 'host_organization_lineage': ['https://openalex.org/P4310320990'], 'host_organization_lineage_names': ['Elsevier BV'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': [], 'open_access': {'is_oa': False, 'oa_status': 'closed', 'oa_url': None, 'any_repository_has_fulltext': False}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5112117723', 'display_name': 'Wen Song Lin', 'orcid': None}, 'institutions': [], 'countries': [], 'is_corresponding': True, 'raw_author_name': 'Wen Lin', 'raw_affiliation_strings': ['fei,LIU Ya li,JI Tiao he'], 'affiliations': [{'raw_affiliation_string': 'fei,LIU Ya li,JI Tiao he', 'institution_ids': []}]}], 'institution_assertions': [], 'countries_distinct_count': 0, 'institutions_distinct_count': 0, 'corresponding_author_ids': ['https://openalex.org/A5112117723'], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 0.0, 'has_fulltext': False, 'cited_by_count': 0, 'citation_normalized_percentile': {'value': 0.0, 'is_in_top_1_percent': False, 'is_in_top_10_percent': False}, 'cited_by_percentile_year': {'min': 0, 'max': 57}, 'biblio': {'volume': None, 'issue': None, 'first_page': None, 'last_page': None}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T14382', 'display_name': 'Electrophoretic Deposition in Materials Science', 'score': 0.893, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T14382', 'display_name': 'Electrophoretic Deposition in Materials Science', 'score': 0.893, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/electrophoretic-deposition', 'display_name': 'Electrophoretic Deposition', 'score': 0.9646517}], 'concepts': [{'id': 'https://openalex.org/C2775891822', 'wikidata': 'https://www.wikidata.org/wiki/Q925358', 'display_name': 'Electrophoretic deposition', 'level': 3, 'score': 0.9646517}, {'id': 'https://openalex.org/C2781448156', 'wikidata': 'https://www.wikidata.org/wiki/Q1570182', 'display_name': 'Coating', 'level': 2, 'score': 0.90903056}, {'id': 'https://openalex.org/C40250595', 'wikidata': 'https://www.wikidata.org/wiki/Q185098', 'display_name': 'Electrophoresis', 'level': 2, 'score': 0.8817567}, {'id': 'https://openalex.org/C513153333', 'wikidata': 'https://www.wikidata.org/wiki/Q663', 'display_name': 'Aluminium', 'level': 2, 'score': 0.60914093}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.59766865}, {'id': 'https://openalex.org/C89395315', 'wikidata': 'https://www.wikidata.org/wiki/Q181232', 'display_name': 'Anode', 'level': 3, 'score': 0.5721054}, {'id': 'https://openalex.org/C98045186', 'wikidata': 'https://www.wikidata.org/wiki/Q205663', 'display_name': 'Process (computing)', 'level': 2, 'score': 0.44867042}, {'id': 'https://openalex.org/C42360764', 'wikidata': 'https://www.wikidata.org/wiki/Q83588', 'display_name': 'Chemical engineering', 'level': 1, 'score': 0.37270093}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.29553282}, {'id': 'https://openalex.org/C191897082', 'wikidata': 'https://www.wikidata.org/wiki/Q11467', 'display_name': 'Metallurgy', 'level': 1, 'score': 0.27722585}, {'id': 'https://openalex.org/C185592680', 'wikidata': 'https://www.wikidata.org/wiki/Q2329', 'display_name': 'Chemistry', 'level': 0, 'score': 0.25815243}, {'id': 'https://openalex.org/C43617362', 'wikidata': 'https://www.wikidata.org/wiki/Q170050', 'display_name': 'Chromatography', 'level': 1, 'score': 0.24169472}, {'id': 'https://openalex.org/C17525397', 'wikidata': 'https://www.wikidata.org/wiki/Q176140', 'display_name': 'Electrode', 'level': 2, 'score': 0.123788595}, {'id': 'https://openalex.org/C41008148', 'wikidata': 'https://www.wikidata.org/wiki/Q21198', 'display_name': 'Computer science', 'level': 0, 'score': 0.10569027}, {'id': 'https://openalex.org/C127413603', 'wikidata': 'https://www.wikidata.org/wiki/Q11023', 'display_name': 'Engineering', 'level': 0, 'score': 0.06420821}, {'id': 'https://openalex.org/C147789679', 'wikidata': 'https://www.wikidata.org/wiki/Q11372', 'display_name': 'Physical chemistry', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C111919701', 'wikidata': 'https://www.wikidata.org/wiki/Q9135', 'display_name': 'Operating system', 'level': 1, 'score': 0.0}], 'mesh': [], 'locations_count': 1, 'locations': [{'is_oa': False, 'landing_page_url': 'https://en.cnki.com.cn/Article_en/CJFDTOTAL-BMJS200203013.htm', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S191474129', 'display_name': 'Surface Technology', 'issn_l': '0376-4583', 'issn': ['0376-4583', '1878-1063'], 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/P4310320990', 'host_organization_name': 'Elsevier BV', 'host_organization_lineage': ['https://openalex.org/P4310320990'], 'host_organization_lineage_names': ['Elsevier BV'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': None, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 0, 'referenced_works': [], 'related_works': ['https://openalex.org/W2879128656', 'https://openalex.org/W2864116396', 'https://openalex.org/W2857930212', 'https://openalex.org/W2845438814', 'https://openalex.org/W2835195765', 'https://openalex.org/W2812682953', 'https://openalex.org/W2811737527', 'https://openalex.org/W2801372641', 'https://openalex.org/W2409493621', 'https://openalex.org/W2397729251', 'https://openalex.org/W2395038759', 'https://openalex.org/W2388947840', 'https://openalex.org/W2380950056', 'https://openalex.org/W2380240238', 'https://openalex.org/W2377165365', 'https://openalex.org/W2365365376', 'https://openalex.org/W2362727072', 'https://openalex.org/W2263790378', 'https://openalex.org/W2223539671', 'https://openalex.org/W1579221460'], 'abstract_inverted_index': None, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2368732744', 'counts_by_year': [], 'updated_date': '2024-12-08T16:21:34.911409', 'created_date': '2016-06-24'}