Title: New Electron Beam Evaporator and its Characteristics
Abstract: During the vacuum evaporation of materials by electron bombardment, the backscattered electrons frequently cause fine cracks and minute irregularities in the evaporated film.To avoid this problem, the behavior of backscattered electrons has been studied using the resistance network method. Electron beam trajectories and the surface temperatures of the tar get being bombarded have been investigated using a pierce-type electron gun and a high AG accelerating potential.From the results obtained, a new electron beam evaporator has been designed which has many advantageous features.