Get quick answers to your questions about the article from our AI researcher chatbot
{'id': 'https://openalex.org/W2131818217', 'doi': 'https://doi.org/10.1088/0957-4484/20/41/415303', 'title': 'Analysis of the blurring in stencil lithography', 'display_name': 'Analysis of the blurring in stencil lithography', 'publication_year': 2009, 'publication_date': '2009-09-18', 'ids': {'openalex': 'https://openalex.org/W2131818217', 'doi': 'https://doi.org/10.1088/0957-4484/20/41/415303', 'mag': '2131818217', 'pmid': 'https://pubmed.ncbi.nlm.nih.gov/19762941'}, 'language': 'en', 'primary_location': {'is_oa': False, 'landing_page_url': 'https://doi.org/10.1088/0957-4484/20/41/415303', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S206811868', 'display_name': 'Nanotechnology', 'issn_l': '0957-4484', 'issn': ['0957-4484', '1361-6528'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320083', 'host_organization_name': 'IOP Publishing', 'host_organization_lineage': ['https://openalex.org/P4310311669', 'https://openalex.org/P4310320083'], 'host_organization_lineage_names': ['Institute of Physics', 'IOP Publishing'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, 'type': 'article', 'type_crossref': 'journal-article', 'indexed_in': ['crossref', 'pubmed'], 'open_access': {'is_oa': True, 'oa_status': 'green', 'oa_url': 'https://infoscience.epfl.ch/record/140809/files/2009_Blurring_Vazquez_Subm_IOPNanotech.pdf', 'any_repository_has_fulltext': True}, 'authorships': [{'author_position': 'first', 'author': {'id': 'https://openalex.org/A5075300811', 'display_name': 'Oscar Vázquez-Mena', 'orcid': 'https://orcid.org/0000-0001-9054-5183'}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'O Vazquez-Mena', 'raw_affiliation_strings': ['Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland'], 'affiliations': [{'raw_affiliation_string': 'Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland', 'institution_ids': ['https://openalex.org/I5124864']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5025457422', 'display_name': 'Luis Guillermo Villanueva', 'orcid': 'https://orcid.org/0000-0003-3340-2930'}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'L G Villanueva', 'raw_affiliation_strings': ['Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland'], 'affiliations': [{'raw_affiliation_string': 'Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland', 'institution_ids': ['https://openalex.org/I5124864']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5064887643', 'display_name': 'Veronica Savu', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'V Savu', 'raw_affiliation_strings': ['Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland'], 'affiliations': [{'raw_affiliation_string': 'Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland', 'institution_ids': ['https://openalex.org/I5124864']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5036095255', 'display_name': 'Katrin Sidler', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'K Sidler', 'raw_affiliation_strings': ['Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland'], 'affiliations': [{'raw_affiliation_string': 'Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland', 'institution_ids': ['https://openalex.org/I5124864']}]}, {'author_position': 'middle', 'author': {'id': 'https://openalex.org/A5009324541', 'display_name': 'Philippe Langlet', 'orcid': None}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'P Langlet', 'raw_affiliation_strings': ['Center of Micro-Nano-Technology, EPFL,#N#Switzerland#N#'], 'affiliations': [{'raw_affiliation_string': 'Center of Micro-Nano-Technology, EPFL,#N#Switzerland#N#', 'institution_ids': ['https://openalex.org/I5124864']}]}, {'author_position': 'last', 'author': {'id': 'https://openalex.org/A5107195137', 'display_name': 'Juergen Brügger', 'orcid': 'https://orcid.org/0000-0002-7710-5930'}, 'institutions': [{'id': 'https://openalex.org/I5124864', 'display_name': 'École Polytechnique Fédérale de Lausanne', 'ror': 'https://ror.org/02s376052', 'country_code': 'CH', 'type': 'education', 'lineage': ['https://openalex.org/I2799323385', 'https://openalex.org/I5124864']}], 'countries': ['CH'], 'is_corresponding': False, 'raw_author_name': 'J Brugger', 'raw_affiliation_strings': ['Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland'], 'affiliations': [{'raw_affiliation_string': 'Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland', 'institution_ids': ['https://openalex.org/I5124864']}]}], 'institution_assertions': [], 'countries_distinct_count': 1, 'institutions_distinct_count': 1, 'corresponding_author_ids': [], 'corresponding_institution_ids': [], 'apc_list': None, 'apc_paid': None, 'fwci': 3.608, 'has_fulltext': True, 'fulltext_origin': 'pdf', 'cited_by_count': 66, 'citation_normalized_percentile': {'value': 0.960995, 'is_in_top_1_percent': False, 'is_in_top_10_percent': True}, 'cited_by_percentile_year': {'min': 95, 'max': 96}, 'biblio': {'volume': '20', 'issue': '41', 'first_page': '415303', 'last_page': '415303'}, 'is_retracted': False, 'is_paratext': False, 'primary_topic': {'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, 'topics': [{'id': 'https://openalex.org/T11338', 'display_name': 'Advancements in Photolithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2208', 'display_name': 'Electrical and Electronic Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T12224', 'display_name': 'Nanofabrication and Lithography Techniques', 'score': 0.9999, 'subfield': {'id': 'https://openalex.org/subfields/2204', 'display_name': 'Biomedical Engineering'}, 'field': {'id': 'https://openalex.org/fields/22', 'display_name': 'Engineering'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}, {'id': 'https://openalex.org/T10923', 'display_name': 'Force Microscopy Techniques and Applications', 'score': 0.9989, 'subfield': {'id': 'https://openalex.org/subfields/3107', 'display_name': 'Atomic and Molecular Physics, and Optics'}, 'field': {'id': 'https://openalex.org/fields/31', 'display_name': 'Physics and Astronomy'}, 'domain': {'id': 'https://openalex.org/domains/3', 'display_name': 'Physical Sciences'}}], 'keywords': [{'id': 'https://openalex.org/keywords/stencil', 'display_name': 'Stencil', 'score': 0.9323343}, {'id': 'https://openalex.org/keywords/deposition', 'display_name': 'Deposition', 'score': 0.6312929}, {'id': 'https://openalex.org/keywords/stencil-lithography', 'display_name': 'Stencil lithography', 'score': 0.5319398}, {'id': 'https://openalex.org/keywords/shadow-mask', 'display_name': 'Shadow mask', 'score': 0.5003936}, {'id': 'https://openalex.org/keywords/aperture', 'display_name': 'Aperture (computer memory)', 'score': 0.4708022}], 'concepts': [{'id': 'https://openalex.org/C76752949', 'wikidata': 'https://www.wikidata.org/wiki/Q7607499', 'display_name': 'Stencil', 'level': 2, 'score': 0.9323343}, {'id': 'https://openalex.org/C192562407', 'wikidata': 'https://www.wikidata.org/wiki/Q228736', 'display_name': 'Materials science', 'level': 0, 'score': 0.7831538}, {'id': 'https://openalex.org/C2777289219', 'wikidata': 'https://www.wikidata.org/wiki/Q7632154', 'display_name': 'Substrate (aquarium)', 'level': 2, 'score': 0.64782214}, {'id': 'https://openalex.org/C64297162', 'wikidata': 'https://www.wikidata.org/wiki/Q1987070', 'display_name': 'Deposition (geology)', 'level': 3, 'score': 0.6312929}, {'id': 'https://openalex.org/C204223013', 'wikidata': 'https://www.wikidata.org/wiki/Q133036', 'display_name': 'Lithography', 'level': 2, 'score': 0.5610227}, {'id': 'https://openalex.org/C120665830', 'wikidata': 'https://www.wikidata.org/wiki/Q14620', 'display_name': 'Optics', 'level': 1, 'score': 0.55313873}, {'id': 'https://openalex.org/C70520399', 'wikidata': 'https://www.wikidata.org/wiki/Q7607503', 'display_name': 'Stencil lithography', 'level': 5, 'score': 0.5319398}, {'id': 'https://openalex.org/C2776326872', 'wikidata': 'https://www.wikidata.org/wiki/Q1192335', 'display_name': 'Shadow mask', 'level': 2, 'score': 0.5003936}, {'id': 'https://openalex.org/C78336883', 'wikidata': 'https://www.wikidata.org/wiki/Q4779385', 'display_name': 'Aperture (computer memory)', 'level': 2, 'score': 0.4708022}, {'id': 'https://openalex.org/C49040817', 'wikidata': 'https://www.wikidata.org/wiki/Q193091', 'display_name': 'Optoelectronics', 'level': 1, 'score': 0.37272304}, {'id': 'https://openalex.org/C171250308', 'wikidata': 'https://www.wikidata.org/wiki/Q11468', 'display_name': 'Nanotechnology', 'level': 1, 'score': 0.23435429}, {'id': 'https://openalex.org/C41794268', 'wikidata': 'https://www.wikidata.org/wiki/Q1408939', 'display_name': 'X-ray lithography', 'level': 4, 'score': 0.15505987}, {'id': 'https://openalex.org/C53524968', 'wikidata': 'https://www.wikidata.org/wiki/Q7315582', 'display_name': 'Resist', 'level': 3, 'score': 0.14954567}, {'id': 'https://openalex.org/C2779227376', 'wikidata': 'https://www.wikidata.org/wiki/Q6505497', 'display_name': 'Layer (electronics)', 'level': 2, 'score': 0.13876137}, {'id': 'https://openalex.org/C41008148', 'wikidata': 'https://www.wikidata.org/wiki/Q21198', 'display_name': 'Computer science', 'level': 0, 'score': 0.12600473}, {'id': 'https://openalex.org/C121332964', 'wikidata': 'https://www.wikidata.org/wiki/Q413', 'display_name': 'Physics', 'level': 0, 'score': 0.09838158}, {'id': 'https://openalex.org/C151730666', 'wikidata': 'https://www.wikidata.org/wiki/Q7205', 'display_name': 'Paleontology', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C111368507', 'wikidata': 'https://www.wikidata.org/wiki/Q43518', 'display_name': 'Oceanography', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C459310', 'wikidata': 'https://www.wikidata.org/wiki/Q117801', 'display_name': 'Computational science', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C2816523', 'wikidata': 'https://www.wikidata.org/wiki/Q180184', 'display_name': 'Sediment', 'level': 2, 'score': 0.0}, {'id': 'https://openalex.org/C24890656', 'wikidata': 'https://www.wikidata.org/wiki/Q82811', 'display_name': 'Acoustics', 'level': 1, 'score': 0.0}, {'id': 'https://openalex.org/C86803240', 'wikidata': 'https://www.wikidata.org/wiki/Q420', 'display_name': 'Biology', 'level': 0, 'score': 0.0}, {'id': 'https://openalex.org/C127313418', 'wikidata': 'https://www.wikidata.org/wiki/Q1069', 'display_name': 'Geology', 'level': 0, 'score': 0.0}], 'mesh': [{'descriptor_ui': 'D049329', 'descriptor_name': 'Nanostructures', 'qualifier_ui': 'Q000737', 'qualifier_name': 'chemistry', 'is_major_topic': True}, {'descriptor_ui': 'D036103', 'descriptor_name': 'Nanotechnology', 'qualifier_ui': 'Q000379', 'qualifier_name': 'methods', 'is_major_topic': True}, {'descriptor_ui': 'D053770', 'descriptor_name': 'Nanowires', 'qualifier_ui': 'Q000737', 'qualifier_name': 'chemistry', 'is_major_topic': True}, {'descriptor_ui': 'D008855', 'descriptor_name': 'Microscopy, Electron, Scanning', 'qualifier_ui': '', 'qualifier_name': None, 'is_major_topic': False}, {'descriptor_ui': 'D049329', 'descriptor_name': 'Nanostructures', 'qualifier_ui': '', 'qualifier_name': None, 'is_major_topic': False}, {'descriptor_ui': 'D049329', 'descriptor_name': 'Nanostructures', 'qualifier_ui': 'Q000648', 'qualifier_name': 'ultrastructure', 'is_major_topic': False}, {'descriptor_ui': 'D036103', 'descriptor_name': 'Nanotechnology', 'qualifier_ui': '', 'qualifier_name': None, 'is_major_topic': False}, {'descriptor_ui': 'D053770', 'descriptor_name': 'Nanowires', 'qualifier_ui': 'Q000648', 'qualifier_name': 'ultrastructure', 'is_major_topic': False}, {'descriptor_ui': 'D053770', 'descriptor_name': 'Nanowires', 'qualifier_ui': '', 'qualifier_name': None, 'is_major_topic': False}], 'locations_count': 3, 'locations': [{'is_oa': False, 'landing_page_url': 'https://doi.org/10.1088/0957-4484/20/41/415303', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S206811868', 'display_name': 'Nanotechnology', 'issn_l': '0957-4484', 'issn': ['0957-4484', '1361-6528'], 'is_oa': False, 'is_in_doaj': False, 'is_core': True, 'host_organization': 'https://openalex.org/P4310320083', 'host_organization_name': 'IOP Publishing', 'host_organization_lineage': ['https://openalex.org/P4310311669', 'https://openalex.org/P4310320083'], 'host_organization_lineage_names': ['Institute of Physics', 'IOP Publishing'], 'type': 'journal'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}, {'is_oa': True, 'landing_page_url': 'https://infoscience.epfl.ch/record/140809/files/2009_Blurring_Vazquez_Subm_IOPNanotech.pdf', 'pdf_url': 'https://infoscience.epfl.ch/record/140809/files/2009_Blurring_Vazquez_Subm_IOPNanotech.pdf', 'source': {'id': 'https://openalex.org/S4306400488', 'display_name': 'Infoscience (Ecole Polytechnique Fédérale de Lausanne)', 'issn_l': None, 'issn': None, 'is_oa': True, 'is_in_doaj': False, 'is_core': False, 'host_organization': None, 'host_organization_name': None, 'host_organization_lineage': [], 'host_organization_lineage_names': [], 'type': 'repository'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, {'is_oa': False, 'landing_page_url': 'https://pubmed.ncbi.nlm.nih.gov/19762941', 'pdf_url': None, 'source': {'id': 'https://openalex.org/S4306525036', 'display_name': 'PubMed', 'issn_l': None, 'issn': None, 'is_oa': False, 'is_in_doaj': False, 'is_core': False, 'host_organization': 'https://openalex.org/I1299303238', 'host_organization_name': 'National Institutes of Health', 'host_organization_lineage': ['https://openalex.org/I1299303238'], 'host_organization_lineage_names': ['National Institutes of Health'], 'type': 'repository'}, 'license': None, 'license_id': None, 'version': None, 'is_accepted': False, 'is_published': False}], 'best_oa_location': {'is_oa': True, 'landing_page_url': 'https://infoscience.epfl.ch/record/140809/files/2009_Blurring_Vazquez_Subm_IOPNanotech.pdf', 'pdf_url': 'https://infoscience.epfl.ch/record/140809/files/2009_Blurring_Vazquez_Subm_IOPNanotech.pdf', 'source': {'id': 'https://openalex.org/S4306400488', 'display_name': 'Infoscience (Ecole Polytechnique Fédérale de Lausanne)', 'issn_l': None, 'issn': None, 'is_oa': True, 'is_in_doaj': False, 'is_core': False, 'host_organization': None, 'host_organization_name': None, 'host_organization_lineage': [], 'host_organization_lineage_names': [], 'type': 'repository'}, 'license': None, 'license_id': None, 'version': 'publishedVersion', 'is_accepted': True, 'is_published': True}, 'sustainable_development_goals': [], 'grants': [], 'datasets': [], 'versions': [], 'referenced_works_count': 32, 'referenced_works': ['https://openalex.org/W1665709017', 'https://openalex.org/W1964107152', 'https://openalex.org/W1971323440', 'https://openalex.org/W1971520976', 'https://openalex.org/W1980532279', 'https://openalex.org/W2002136416', 'https://openalex.org/W2010397121', 'https://openalex.org/W2011023385', 'https://openalex.org/W2012941864', 'https://openalex.org/W2015937030', 'https://openalex.org/W2016342614', 'https://openalex.org/W2034889331', 'https://openalex.org/W2036901450', 'https://openalex.org/W2039618303', 'https://openalex.org/W2047205370', 'https://openalex.org/W2049670437', 'https://openalex.org/W2050132318', 'https://openalex.org/W2070647821', 'https://openalex.org/W2072396175', 'https://openalex.org/W2078038825', 'https://openalex.org/W2080396571', 'https://openalex.org/W2080836892', 'https://openalex.org/W2121849860', 'https://openalex.org/W2150604923', 'https://openalex.org/W2153563966', 'https://openalex.org/W2169984857', 'https://openalex.org/W2171366069', 'https://openalex.org/W2175786124', 'https://openalex.org/W2183197316', 'https://openalex.org/W2206385443', 'https://openalex.org/W4231314842', 'https://openalex.org/W4292023294'], 'related_works': ['https://openalex.org/W2185378404', 'https://openalex.org/W2138809177', 'https://openalex.org/W2104619445', 'https://openalex.org/W2098290863', 'https://openalex.org/W2055070438', 'https://openalex.org/W2014564366', 'https://openalex.org/W1986288024', 'https://openalex.org/W1975974156', 'https://openalex.org/W1584805413', 'https://openalex.org/W1492209788'], 'abstract_inverted_index': {'A': [0], 'quantitative': [1], 'analysis': [2], 'of': [3, 55, 74, 85, 99, 110, 117, 126], 'blurring': [4, 27, 68, 98, 163], 'and': [5, 12, 51, 96, 113, 155, 176], 'its': [6], 'dependence': [7], 'on': [8, 38, 148], 'the': [9, 13, 34, 39, 44, 60, 75, 86, 94, 97, 100, 130, 149, 151, 162, 169, 173, 177], 'stencil-substrate': [10], 'gap': [11, 76, 95, 124], 'deposition': [14, 157, 171, 174], 'parameters': [15], 'in': [16, 30, 145], 'stencil': [17, 45, 152], 'lithography,': [18], 'a': [19, 53, 72, 82, 90, 107, 114, 123], 'high': [20], 'resolution': [21], 'shadow': [22], 'mask': [23], 'technique,': [24], 'is': [25, 28, 41, 57, 69], 'presented.The': [26], 'manifested': [29], 'two': [31], 'ways:': [32], 'first,': [33], 'structure': [35], 'directly': [36, 101, 131], 'deposited': [37, 61, 102, 132], 'substrate': [40, 178], 'larger': [42], 'than': [43], 'aperture': [46, 153], 'due': [47, 64], 'to': [48, 65, 142], 'geometrical': [49], 'factors,': [50], 'second,': [52], 'halo': [54, 138], 'material': [56, 108], 'formed': [58], 'surrounding': [59], 'structure,': [62], 'presumably': [63], 'surface': [66], 'diffusion.The': [67], 'studied': [70], 'as': [71], 'function': [73], 'using': [77], 'dedicated': [78], 'stencils': [79], 'that': [80, 122, 161], 'allow': [81], 'controlled': [83], 'variation': [84], 'gap.Our': [87], 'results': [88], 'show': [89, 160], 'linear': [91], 'relationship': [92], 'between': [93], 'structure.In': [103], 'our': [104], 'configuration,': [105], 'with': [106], 'source': [109], '∼5': [111], 'mm': [112], 'source-substrate': [115], 'distance': [116], '1': [118], 'm,': [119], 'we': [120], 'find': [121], 'size': [125, 154], '∼10': [127], 'μm': [128, 144], 'enlarges': [129], 'structures': [133], 'by': [134, 167], '∼50': [135], 'nm.The': [136], 'measured': [137], 'varies': [139], 'from': [140], '0.2': [141], '3': [143], 'width': [146], 'depending': [147], 'gap,': [150], 'other': [156], 'parameters.We': [158], 'also': [159], 'can': [164], 'be': [165], 'reduced': [166], 'decreasing': [168], 'nominal': [170], 'thickness,': [172], 'rate': [175], 'temperature.': [179]}, 'cited_by_api_url': 'https://api.openalex.org/works?filter=cites:W2131818217', 'counts_by_year': [{'year': 2024, 'cited_by_count': 4}, {'year': 2023, 'cited_by_count': 4}, {'year': 2022, 'cited_by_count': 4}, {'year': 2021, 'cited_by_count': 3}, {'year': 2020, 'cited_by_count': 3}, {'year': 2019, 'cited_by_count': 6}, {'year': 2018, 'cited_by_count': 3}, {'year': 2017, 'cited_by_count': 5}, {'year': 2016, 'cited_by_count': 2}, {'year': 2015, 'cited_by_count': 5}, {'year': 2014, 'cited_by_count': 7}, {'year': 2013, 'cited_by_count': 5}, {'year': 2012, 'cited_by_count': 3}], 'updated_date': '2025-01-11T17:54:59.492451', 'created_date': '2016-06-24'}