Title: Submicrometer thickness layer fabrication for layer-by-layer microstereolithography using evanescent light
Abstract: Abstract We propose a novel one-shot layer-by-layer microstereolithography method using evanescent light to achieve submicrometer spatial process resolution. Theoretical and experimental analyses focusing on the vertical process resolution confirm that a layer of submicrometer thickness can be photopolymerized with good thickness controllability (standard deviation of 10 nm) and that the proposed method of using evanescent light is compatible with layer-by-layer stereolithography.
Publication Year: 2012
Publication Date: 2012-01-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 13
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