Title: Deposition of a thin polystyrene film by anthracene-photosensitized laser ablation at 351 nm
Abstract: Pulsed laser deposition of polystyrene (PSt) was investigated using infrared and UV absorption spectroscopy. The essential of the present study is to use a PSt target doped with anthracene which plays an important role as a photosensitizer to induce ablation. Four types of deposition were examined by changing laser wavelength (248 and 351 nm) and ablation target (neat and doped PSt). For both of the targets, 248 nm ablation deposited no film, while 351 nm deposition gave thin films. In the latter, only when 351 nm laser light and the doped target were employed, a thin PSt film was deposited.
Publication Year: 1999
Publication Date: 1999-06-21
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 20
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