Title: Reactive ion beam etching of multilayer diffraction gratings with SiO 2 as the top layer
Abstract: Multilayer dielectric grating plays an important role in the laser inertial confinement fusion, which is fabricated by using holographic lithography and ion beam etching. In this paper details the reactive ion beam etching of multilayer dielectric grating with SiO<sub>2</sub> as the top layer. The etching of SiO<sub>2</sub> was carried out by a radio frequency reactive ion beam etcher with CHF<sub>3</sub> chemistry to increase the etch selectivity and get a high fidelity grating pattern transfer from photoresist into SiO<sub>2</sub> coating. The photoresist gratings with different profiles as masks were used to create SiO<sub>2</sub> corrugations with different profiles separately. The etching results were analyzed in detail, including the facet and redeposition effects. In conclusion, it is essential that the photoresist grating mask should be high and steep enough to get SiO<sub>2</sub> grating with vertical profiles. The multilayer dielectric grating with SiO<sub>2</sub> as the top layer exhibited an efficiency of about 95% in the - 1 order at TE polarization of 1 064 nm light at Littrow mounting.
Publication Year: 2007
Publication Date: 2007-11-12
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 1
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