Title: Chemical Vapor Deposition of Amorphous Boron on Massive Substrates
Abstract:Compact coatings of amorphous boron were deposited on the smooth surface of substrates such as graphite, refractory metals, iron, and stainless steel using the reduction of boron trichloride by hydrog...Compact coatings of amorphous boron were deposited on the smooth surface of substrates such as graphite, refractory metals, iron, and stainless steel using the reduction of boron trichloride by hydrogen. With a constant surface temperature and a low deposition efficiency, a constant thickness is obtained if transport limitations are avoided at all points of the surface. Extension of the results is proposed for a deposition on larger surfaces and substrates of complex shape. The rate of deposition was studied at temperatures ranging from 950° to 1200°C. The apparent activation energy was found equal to 31.4 kcal/mole. Adherence and absence of cracks are a function of the specific nature of the substrate. The most satisfactory coatings were obtained on graphite, refractory metals of Group Vb, iron, and stainless steel. On iron and stainless steel, a diffusion barrier was first deposited by pack cementation, which avoids the transport of the metals and slows down the boron diffusion. Boron morphology regularity is shown to be a function of nucleation.Read More
Publication Year: 1976
Publication Date: 1976-02-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 37
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