Title: Exchange coupling between two magnetic films separated by an antiferromagnetic spacer
Abstract: An expression for the interaction strength between two magnetic films separated by an insulating antiferromagnet spacer has been derived as a function of temperature and thickness. We consider the mechanism wherein the magnetic interaction between the ferromagnetic layers is mediated by the intervening antiferromagnetic insulator via the Suhl–Nakamura (SN) interaction. The interaction energy per unit area, σSN, is derived as σSN=18(JC2/JAF)(δ/a)exp(−t/δ). Here, JAF is the magnetic coupling constant between nearest-neighbor antiferromagnetic spins in the spacer, JC is the effective coupling constant (which is greatly reduced from the Heisenberg exchange constant), between the spins in the ferromagnetic film and the nearest-neighbor spins in the antiferromagnetic spacer, t is the separation of the two ferromagnetic plates, and δ is the width of an antiferromagnetic domain wall. This mechanism is the antiferromagnetic analog of the Ruderman–Kittel oscillatory coupling between two magnetic films separated by a normal metal.
Publication Year: 1999
Publication Date: 1999-04-15
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 2
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