Title: Effect of Anion in Developer on Dissolution Characteristics of Photoresist
Abstract: The dissolution characteristics of photoresist in developers with added tetramethylammonium salts are discussed. It was observed that the dissolution rate of the photoresist was increased by adding tetramethylammonium salts to the developer. As the size of the anion of the added TMA salt becomes larger (I - >Br - >Cl - ), the effect on the dissolution rate of the resist becomes greater. This “anion effect” is significant on unexposed and less exposed resists in which photoactive compound and novolak resin interact with each other strongly, while it becomes most negligible on fully exposed resists in which they interact weakly. It has also been found that the anion in the developer plays an important role in reducing the resist residue.
Publication Year: 1991
Publication Date: 1991-01-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 1
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