Title: Microstructural studies of TiN coatings prepared by PVD and IBAD
Abstract: Titanium nitride (TiN) films have been deposited by physical vapour deposition (PVD), with BALZER equipment, and ion beam assisted deposition (IBAD) process, in DANFYSIK chamber. TiN thin films were grown, during IBAD process, by evaporation of Ti in presence of N2 and simultaneous bombarded with Ar+ ions. The evolution of the microstructure from porous and columnar grains to densel packed grains is accompanied by changes in mechanical and physical properties.
Publication Year: 2004
Publication Date: 2004-06-18
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 35
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