Title: Single-element rotating-polarizer ellipsometer for film-substrate systems
Abstract:A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the ...A novel and very simple ellipsometer for the characterization of film-substrate systems that employs one rotating optical element (a polarizer) is proposed. The ellipsometer is based on detecting the angles of incidence at which a film-substrate system has equal amplitude attenuations for light polarized parallel (p) and perpendicular (s) to the plane of incidence. At a certain wavelength, the film thickness of the film-substrate system has to lie within permissible-thickness bands (PTB) for the technique to apply.Read More
Publication Year: 1977
Publication Date: 1977-09-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 11
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot