Title: Characterization of rapid thermal processing oxynitrides by SIMS and XPS analyses
Abstract: Aim of this work is the characterisation of oxynitride films grown by rapid thermal processing (RTP) using nitrous oxide and nitric oxide precursors. The thickness of the oxynitrided layers is about 7 nm. Secondary ion mass spectrometry (SIMS) and X-ray photoemission spectroscopy (XPS) have been employed to obtain a complete chemical characterisation. XPS analyses have been performed at different depths after removal of oxynitride layers by chemical etching. SIMS and XPS analyses have been performed on the same samples after a reoxidation treatment as well. Depending on the precursors used, the oxynitrides show different characteristics.
Publication Year: 1999
Publication Date: 1999-04-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 9
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