Title: X-ray photoelectron spectroscopy characteristics of the W/TiN/Si and W/TiN/SiO2/Si structures
Abstract: X-ray photoelectron spectroscopy (XPS) has been used to study the characteristics of titanium nitride (TiN) as a nucleation layer for the deposition of low pressure chemical vapor deposited tungsten (LPCVD-W) onto SiO2. The XPS depth profiles and the chemical analysis of the as-deposited W/TiN/Si (with sputtered TiN) and W/TiN/SiO2/Si (with LPCVD-TiN) structures suggest that the chemical interaction of TiN with W and with Si/SiO2 substrates tends to be minimal.
Publication Year: 1993
Publication Date: 1993-08-01
Language: en
Type: article
Indexed In: ['crossref']
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Cited By Count: 6
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