Title: NMOS process simulator using Monte Carlo methods
Abstract: An NMOS process simulator is developed, which incorporates both process simulation and device modelling. Accurate models of the basic physical process are implemented in a comprehensive NMOS process simulator. NMOS process simulator is able to predict device structures resulting from any proposed fabrication sequence. The proposed NMOS process simulator can predict NMOS device parameter variations using Monte Carlo methods. NMOS process simulator can be used to simulate NMOS process parameter variations and layout dimensions with 90% accuracy.
Publication Year: 1990
Publication Date: 1990-01-01
Language: en
Type: article
Indexed In: ['crossref']
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