Title: Comment on ‘Ion-beam mixing with chemical guidance. IV. Thermodynamic effects without invoking thermal spikes’ by Antonio Miotello and Roger Kelly
Abstract: The depth profiling in combination with sputtering of multilayered structures is considered by the proposed models. In order to emphasize the changes in the surface composition produced by the processes of surface topography development and ion mixing during profiling two different models are proposed and considered separately. The first one includes the processes of surface roughening as a result of sputtering and smoothing of rough surface as a result of surface atom migration (no mixing in the bulk of sample). The second model includes the sequential removal of surface atoms (no surface roughening) and ion mixing in the bulk of the sample. The dependencies of the main characteristics such as the amplitude and the shape of the peaks of the oscillations of the surface concentration, surface roughness and depth resolution on sputtering time and ion beam parameters are calculated and analyzed. The influence of the ion energy, angle of incidence, ion flux and substrate temperature to the depth profile of multilayered structure are studied.
Publication Year: 1995
Publication Date: 1995-05-01
Language: en
Type: article
Indexed In: ['crossref']
Access and Citation
Cited By Count: 1
AI Researcher Chatbot
Get quick answers to your questions about the article from our AI researcher chatbot